Apparatus for plating and method of plating
US-2023146732-A1 · May 11, 2023 · US
US10745820B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10745820-B2 |
| Application number | US-201515540696-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 8, 2015 |
| Priority date | Dec 31, 2014 |
| Publication date | Aug 18, 2020 |
| Grant date | Aug 18, 2020 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A method and system for manufacturing an optical article is provided. The method may comprise providing at least one ophthalmic lens substrate having a surface; applying at least one conductive coating on at least a portion the ophthalmic lens substrate; and electroplating the ophthalmic lens substrate to form a plating layer that is in a contacting relationship with the conductive coating of the optical article. Other layers may also be applied.
Opening claim text (preview).
What is claimed is: 1. A method for manufacturing an optical article, the method comprising: providing at least one ophthalmic lens substrate having a surface; applying at least one SiO 2 layer on the surface of the at least one ophthalmic lens substrate; applying at least one strike layer on the SiO 2 layer of the at least one ophthalmic lens substrate, the at least one strike layer being a conductive transparent material that is compatible with and configured to adhere to the at least one ophthalmic lens substrate; and electroplating the ophthalmic lens substrate to form a plating layer that is in a contacting relationship with the conductive transparent material, the plating layer being compatible with and configured to adhere to the strike layer. 2. The method of claim 1 , wherein the strike layer is applied onto the surface of the ophthalmic lens substrate by any one of the group comprising: physical vapor deposition (PVD), chemical vapor deposition (CVD), sputtering, dip coating, and spin coating. 3. The method of claim 1 , further comprising immersing the at least one ophthalmic lens substrate into an immersion bath. 4. The method of claim 1 , wherein the at least one ophthalmic lens substrate functions as a cathode. 5. The method of claim 1 , wherein the at least one ophthalmic lens substrate functions as an anode. 6. The method of claim 1 , wherein the electroplating is selected from at least one of the methods of the group comprising: electroless deposition, pulse electroplating, and brush coating deposition. 7. The method of claim 1 , further comprising one or more of the following steps before applying the at least one SiO 2 layer: de-greasing the lens substrate; pre-etching the lens substrate; etching the lens substrate; and rinsing the lens substrate. 8. The method of claim 1 , the method comprising one or more of the following steps after applying the conductive coating: etching the lens substrate; anodizing the lens substrate; tinting the lens substrate; sealing the lens substrate; electropolishing the lens substrate; and applying a coating to the lens substrate.
for sealing layers · CPC title
using organic dyestuffs · CPC title
of aluminium or alloys based thereon · CPC title
Mirrors; Reflectors · CPC title
of plastics · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.