Method for producing a reflective optical element, reflective optical element, and use of a reflective optical element

Patent metadata

Field	Value
Publication number	US-11372334-B2
Application number	US-201916686600-A
Country	US
Kind code	B2
Filing date	Nov 18, 2019
Priority date	Jan 22, 2015
Publication date	Jun 28, 2022
Grant date	Jun 28, 2022

Abstract

The disclosure provides a method that includes filling a cavity in a substrate with a second material, wherein the substrate includes a first material. The method also includes using galvanic and/or chemical deposition of a third material to apply an overcoating to a first surface of the substrate in a region of the cavity. The method further includes removing the second material from the cavity. In addition, the method includes, before or after removing the second material from the cavity, applying a reflective layer to the overcoating. The disclosure also provides related optical articles and systems.

First claim

What is claimed is:

1. An optical element, comprising:
a substrate;
an overcoating comprising a galvanically or chemically deposited layer on a first surface of the substrate;
a cavity configured to receive a fluid; and
a reflective layer comprising an optically effective surface,
wherein:
the cavity is near the first surface of the substrate;
the overcoating extends over the cavity;
the cavity is free of material of the overcoating; and
the reflective layer is on a surface of the overcoating that faces away from the substrate.

2. The optical element of claim 1 , wherein the cavity comprises at least one channel.

3. The optical element of claim 1 , wherein cavity comprises a plurality of channels, and the channels have a width which is in the range from a few micrometers to around one millimeter.

4. The optical element of claim 1 , wherein the cavity comprises an opening that leads into the optically effective surface of the reflective layer.

5. The optical element of claim 1 , wherein the substrate comprises steel, a copper alloy and/or aluminum-silicon.

6. The optical element of claim 1 , wherein the overcoating comprises copper, nickel and/or nickel with phosphorus.

7. The optical element of claim 1 , wherein the materials of the substrate and of the overcoating have an at least approximately identical coefficient of thermal expansion.

8. The optical element of claim 1 , wherein the material(s) of the overcoating have a coefficient of thermal expansion which is greater than a coefficient of thermal expansion of the material(s) of the substrate.

9. The optical element of claim 1 , wherein the overcoating has a uniform thickness, or wherein the overcoating has a thickness that varies over the first surface of the substrate.

10. An optical system, comprising:
a mirror comprising the optical element of claim 1 ,
wherein the optical system is configured to be used in the VUV, EUV or even shorter-wave spectral range or for material processing with high-intensity light.

11. A system, comprising:
a collector mirror comprising the optical element of claim 1 ,
wherein the system is an EUV microlithography system.

12. A system, comprising:
an article comprising the optical element of claim 1 ,
wherein the article comprises an optical compensator and/or manipulator, and the cavity is subjectable to variable pressure to compensate for an undesired deformation of the optically effective surface to produce a desired deformation in the optically effective surface.

13. The optical element of claim 6 , wherein the substrate comprises steel, a copper alloy and/or aluminum-silicon.

14. The optical element of claim 6 , wherein the substrate comprises an aluminum-silicon comprising up to 35% silicon.

15. The optical element of claim 14 , wherein the optical element comprises a mirror.

16. The optical element of claim 1 , wherein the substrate comprises steel, a copper alloy and/or aluminum-silicon.

17. The optical element of claim 16 , wherein the optical element comprises a mirror.

18. The optical element of claim 1 , wherein the substrate comprises an aluminum-silicon comprising up to 35% silicon.

19. The optical element of claim 18 , wherein the optical element comprises a mirror.

20. The optical element of claim 1 , wherein a difference between a coefficient of thermal expansion of the substrate and a coefficient of thermal expansion of the overcoating is less than 10 ppm/K.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Bauer Markus
• Bingel Ulrich
• Anderl Willi

Classifications

• B29D11/00596

  Mirrors · CPC title

• G02B5/0891

  Ultraviolet [UV] mirrors (apparatus for microlithography exposure G03F7/70; X-ray multilayer structures G21K1/06) · CPC title

• C25D7/08

  Mirrors; Reflectors · CPC title

• G02B5/1847

  Manufacturing methods · CPC title

• G03F7/70266 Primary

  Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction · CPC title