Photoresist composition and a method for forming a fine pattern using the same

Patent metadata

Field	Value
Publication number	US-10691018-B2
Application number	US-201715702839-A
Country	US
Kind code	B2
Filing date	Sep 13, 2017
Priority date	Dec 8, 2016
Publication date	Jun 23, 2020
Grant date	Jun 23, 2020

Abstract

A photoresist composition includes a photosensitive polymer including a polymer chain and at least one first functional group coupled to the polymer chain, and a photoacid generator. The first functional group has a structure represented by the following Chemical Formula 1,

where R 1 is one of an alkyl group having a carbon number of 1 to 20 and an aryl group having a carbon number of 1 to 20, and R 2 is one of —H, —F, —Cl, —Br, an alkyl group having a carbon number of 1 to 20, and an aryl group having a carbon number of 1 to 20.

First claim

What is claimed is:

1. A photoresist composition, comprising:
a photosensitive polymer including a polymer chain and at least one first functional group coupled to the polymer chain; and
a photoacid generator,
wherein the photosensitive polymer includes a structure represented by the following Chemical Formula 2 or the following Chemical Formula 3,

where n is an integral number ranging from 1 to 1,000,000, R 3 is one of —H and CH 3 , and R is represented by the following Chemical Formula 4,

where R 1 is one of an alkyl group having a carbon number of 1 to 20 and an aryl group having a carbon number of 1 to 20, and R 2 is one of —H, —F, —Cl, —Br, an alkyl group having a carbon number of 1 to 20, and an aryl group having a carbon number of 1 to 20.

2. The photoresist composition as claimed in claim 1 , wherein;
the photoacid generator generates acid ions (H + ) when the photoacid generator is exposed to light, and
the first functional group is converted into a second functional group by a de-protection reaction using the acid ions (H + ) as a catalyst, the second functional group having a structure represented by the following Chemical Formula 8,

where R 1 is one of an alkyl group having a carbon number of 1 to 20 and an aryl group having a carbon number of 1 to 20, and R 2 is one of —H, —F, —Cl, —Br, an alkyl group having a carbon number of 1 to 20, and an aryl group having a carbon number of 1 to 20.

3. A photoresist composition, comprising:
a photosensitive polymer including a polymer chain and a first functional group coupled to the polymer chain, and a photoacid generator, wherein:
the photoacid generator generates acid ions (H + ) when the photoacid generator is exposed to light, and
the first functional group is convertible into a second functional group by a de-protection reaction using the acid ions (H + ) as a catalyst, wherein the second functional group has a structure represented by the following Chemical Formula 8,

where R 1 is one of an alkyl group having a carbon number of 1 to 20 and an aryl group having a carbon number of 1 to 20, and R 2 is one of —H, —F, —Cl, —Br, an alkyl group having a carbon number of 1 to 20, and an aryl group having a carbon number of 1 to 20, and wherein the polymer is hydrophilic when it contains the first functional group and hydrophobic when the first functional group is converted into the second functional group, and
wherein the photosensitive polymer includes a structure represented by the following Chemical Formula 2 or the following Chemical Formula 3,

where n is an integral number ranging from 1 to 1,000,000, R 3 is one of —H and CH 3 , and R is represented by the following Chemical Formula 4,

where R 1 is one of an alkyl group having a carbon number of 1 to 20 and an aryl group having a carbon number of 1 to 20, and R 2 is one of —H, —F, —Cl, —Br, an alkyl group having a carbon number of 1 to 20, and an aryl group having a carbon number of 1 to 20.

4. The photoresist composition as claimed in claim 3 , wherein the first functional group has a structure represented by the following Chemical Formula 1,

where R 1 is one of an alkyl group having a carbon number of 1 to 20 and an aryl group having a carbon number of 1 to 20, and R 2 is an alkyl group having a carbon number of 1 to 20 or an aryl group having a carbon number of 1 to 20.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Park Jin
• Kim Hyunwoo

Classifications

• H10P76/2041

  Photolithographic processes · CPC title

• C08F20/18 Primary

  with acrylic or methacrylic acids · CPC title

• G03F7/26

  Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence) · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• G03F7/004 Primary

  Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title