Resist stripper and resist stripping method

Patent metadata

Field	Value
Publication number	US-10656519-B2
Application number	US-201715818211-A
Country	US
Kind code	B2
Filing date	Nov 20, 2017
Priority date	Nov 22, 2016
Publication date	May 19, 2020
Grant date	May 19, 2020

Abstract

An object of the present invention is to provide a resist stripper for stripping resist from a substrate with a metallic line and/or a metal oxide film, which has excellent stripping properties and shows reduced reattachment of stripped resist, and which is also excellent in antifoaming properties. The resist stripper contains: (A) an amine; (B) an organic solvent; and (C) 5.0 wt % or less of a sulfonic or carboxylic acid having a weight average molecular weight of 5,000 to 1,000,000 or a salt thereof, and the resist stripper is free of (D) water, or contains (D) 60 wt % or less of water.

First claim

The invention claimed is:

1. A resist stripper, comprising:
(A) an amine;
(B) an organic solvent; and
(C) 0.0025 wt % or more and 1.5 wt % or less of a polyanilinesulfonic acid having a weight average molecular weight of 5,000 to 1,000,000 or a salt thereof.

2. The resist stripper according to claim 1 ,
wherein the resist stripper comprises 1 to 40 wt % of an alkanolamine as the component (A).

3. The resist stripper according to claim 1 ,
which is used to strip resist from a substrate with copper and/or IGZO.

4. A method for stripping resist from a substrate with a metallic line and/or a metal oxide film, and inhibiting reattachment of stripped resist to the metallic line and/or the metal oxide film, the method comprising using the resist stripper according to claim 1 .

5. The method for stripping resist according to claim 4 ,
wherein the metallic line is formed of copper and the metal oxide film is formed of IGZO.

6. The method according to claim 4 , wherein the metallic line is copper and/or the metal oxide film is IGZO.

7. The resist stripper according to claim 1 ,
wherein the resist stripper further comprises (D) water in an amount of 60 wt % or less.

8. The resist stripper according to claim 7 ,
wherein the component (B) and the component (D) are present in a ratio by weight of (B):(D) of 0.2:1 to 70:1.

Assignees

• Nagase Chemtex Corp

Inventors

• Mukai Yoshihiro

Classifications

• C11D7/5004

  Organic solvents · CPC title

• G03F7/425 Primary

  containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen · CPC title

• G03F7/0035 Primary

  Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface · CPC title

• G03F7/426

  containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides · CPC title

• H10P95/00

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title