Method of forming thin film and method of manufacturing integrated circuit device using the same

Patent metadata

Field	Value
Publication number	US-10600643-B2
Application number	US-201815866568-A
Country	US
Kind code	B2
Filing date	Jan 10, 2018
Priority date	May 25, 2017
Publication date	Mar 24, 2020
Grant date	Mar 24, 2020

Abstract

A method of forming a thin film and an integrated circuit device, including forming a first reaction inhibiting layer chemisorbed on a first portion of a lower film by supplying a reaction inhibiting compound having a carbonyl group to an exposed surface of the lower film at a temperature of about 300° C. to about 600° C.; forming a first precursor layer of a first material chemisorbed on a second portion of the lower film at a temperature of about 300° C. to about 600° C., the second portion being exposed through the first reaction inhibiting layer; and forming a first monolayer containing the first material on the lower film by supplying a reactive gas to the first reaction inhibiting layer and the first precursor layer and removing the first reaction inhibiting layer from the surface of the lower film, and thus exposing the first portion.

First claim

What is claimed is:

1. A method of forming a thin film, the method comprising:
forming a first reaction inhibiting layer chemisorbed on a first portion of a lower film by supplying a reaction inhibiting compound having a carbonyl group to an exposed surface of the lower film at a temperature of about 300° C. to about 600° C.;
forming a first precursor layer of a first material chemisorbed on a second portion of the lower film at a temperature of about 300° C. to about 600° C., the second portion being exposed through the first reaction inhibiting layer; and
forming a first monolayer containing the first material on the lower film by supplying a reactive gas to the first reaction inhibiting layer and the first precursor layer and removing the first reaction inhibiting layer from the surface of the lower film, and thus exposing the first portion.

2. The method as claimed in claim 1 , wherein the reaction inhibiting compound includes a ketone functional group, a diketone functional group, a triketone functional group, a ketene functional group, an aldehyde functional group, an ester functional group, a carboxylic acid functional group, or an amide functional group.

3. The method as claimed in claim 1 , wherein the reaction inhibiting compound is a β-diketone compound.

4. The method as claimed in claim 1 , wherein the reactive gas is an oxidizing gas or a nitriding gas.

5. The method as claimed in claim 1 , wherein the reactive gas includes O 3 .

6. The method as claimed in claim 1 , wherein the first material is a metal or a semi-metal.

7. The method as claimed in claim 1 , wherein the first material is aluminum (Al).

8. The method as claimed in claim 1 , wherein:
the lower film includes a first metal oxide having a first dielectric constant, and
the first monolayer includes a second metal oxide having a second dielectric constant, the second dielectric constant being less than the first dielectric constant.

9. The method as claimed in claim 1 , further comprising, after forming the first monolayer:
forming a second reaction inhibiting layer chemisorbed on the first monolayer and the first portion of the lower film by supplying the reaction inhibiting compound to the first monolayer and the first portion of the lower film;
forming a second precursor layer of the first material chemisorbed on some portions of the first monolayer exposed through the second reaction inhibiting layer; and
supplying the reactive gas to the second reaction inhibiting layer and the second precursor layer to form a second monolayer containing the first material by a reaction between the reactive gas and the second precursor layer while removing the second reaction inhibiting layer by a reaction between the reactive gas and the second reaction inhibiting layer.

10. The method as claimed in claim 9 , wherein, in the forming of the second monolayer, at least some portions of the second monolayer are deposited on the lower film from the first monolayer in a lateral direction, which is parallel to an extension direction of a main surface of the lower film.

11. A method of manufacturing an integrated circuit device, the method comprising:
forming a lower structure on a substrate, and
forming an aluminum-containing film on the lower structure by performing the method as claimed in claim 1 .

12. The method as claimed in claim 11 , wherein:
forming the lower structure includes:
forming a lower electrode of a capacitor on the substrate, and
forming a zirconium oxide film, of which some portions are in an amorphous state, on the lower electrode at a first temperature of less than 300° C., and

forming the film containing aluminum includes:
forming the first reaction inhibiting layer chemisorbed on a surface of the zirconium oxide film by supplying the reaction inhibiting compound to the surface of the zirconium oxide film at a second temperature of about 300° C. to about 600° C. to crystallize at least some portions of the zirconium oxide film,
forming a first aluminum precursor layer chemisorbed on the surface of the zirconium oxide film at a third temperature that is greater than the first temperature, the zirconium oxide film being exposed through the first reaction inhibiting layer, and
forming a first monolayer that includes aluminum oxide from the first aluminum precursor layer by supplying an oxidizing agent to the first reaction inhibiting layer and the first aluminum precursor layer at a fourth temperature that is greater than the first temperature, and simultaneously exposing some portions of the zirconium oxide film through the first monolayer by removing the first reaction inhibiting layer from the zirconium oxide film.

13. The method as claimed in claim 12 , wherein the reaction inhibiting compound includes a ketone functional group, a diketone functional group, a triketone functional group, a ketene functional group, an aldehyde functional group, an ester functional group, a carboxylic acid functional group, or an amide functional group.

14. The method as claimed in claim 12 , wherein the third temperature and the fourth temperature are each independently about 300° C. to about 600° C.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Park Gyu-Hee
• Kim Youn-Soo
• Kim Hyun-Jun
• Lee Jin-Sun
• Lim Jae-Soon

Classifications

• H10P14/69395

  the material containing zirconium, e.g. ZrO2 · CPC title

• H10P14/69391

  the material containing aluminium, e.g. Al2O3 · CPC title

• H10P14/6544

  to change the morphology of the insulating materials, e.g. transformation of an amorphous layer into a crystalline layer · CPC title

• H10P14/6512

  by exposure to a gas or vapour · CPC title

• H10P14/6339 Primary

  deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD · CPC title