Method for fabricating semiconductor structure
US-2017047284-A1 · Feb 16, 2017 · US
US10580558B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10580558-B2 |
| Application number | US-201715641238-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 4, 2017 |
| Priority date | Jun 7, 2017 |
| Publication date | Mar 3, 2020 |
| Grant date | Mar 3, 2020 |
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A texture inducing structure for alloy films is provided. The texture inducing structure includes a substrate, a texture-inducing layer and a deposition layer. The texture-inducing layer is formed on the substrate. The texture-inducing layer has an intrinsically strong crystalline texture, a texture coefficient of the texture-inducing layer is greater than 2, and a thickness of the texture-inducing layer is ranged from 0.1 μm to 6 μm. The deposition layer is formed on the texture-inducing layer. A texture of the deposition layer is induced by the texture-inducing layer thereby changing the magnetic anisotropy and the magnetic strength of the deposition layer, a thickness of the deposition layer is ranged from 1 μm˜60 μm, and the thickness of the deposition layer is greater than that of the texture-inducing layer.
Opening claim text (preview).
What is claimed is: 1. A texture inducing structure for alloy films, the texture inducing structure comprising: a substrate; a texture-inducing layer formed on the substrate, wherein the texture-inducing layer has an intrinsically crystalline texture, a texture coefficient of the texture-inducing layer is greater than 2, and a thickness of the texture-inducing layer is ranged from 0.1 μm to 6 μm; and a deposition layer formed on the texture-inducing layer, wherein the texture of the deposition layer is induced by the texture-inducing layer thereby changing the magnetic anisotropy and the magnetic strength of the deposition layer, a thickness of the deposition layer is ranged from 1˜60 μm, and the thickness of the deposition layer is greater than that of the texture-inducing layer; wherein the texture coefficient of the texture-inducing layer can be calculated by the following equation: T . C . ( 002 ) = I ( 002 ) / I 0 ( 002 ) 1 n ∑ [ I ( h k l ) / I 0 ( h k l ) ] ; where I (002) and I (hkl) are the intensities of the peaks of X-ray diffraction patterns of HCP (002) and HCP (hkl) taken on the texture-inducing layer, respectively; I 0(002) and I 0(hkl) are the intensities of the peaks of standard X-ray diffraction patterns from JCPDS card of HCP (002) and HCP (hkl) of the texture-inducing layer, respectively. 2. The texture inducing structure of claim 1 , wherein a single layer of the texture-inducing layer and a single layer of the deposition layer are stacked to form a composite structure, and the composite structure is repeatedly stacked to form a multilayered composite structure. 3. The texture inducing structure of claim 1 , wherein the texture coefficient of the texture-inducing layer is greater than 2.5, and the thickness of the texture-inducing layer is ranged from 0.1 μm˜6 μm. 4. The texture inducing structure of claim 1 , wherein the texture-inducing layer is a CoP alloy or a CoNiMnP alloy. 5. The texture inducing structure of claim 1 , wherein the texture-inducing layer and the deposition layer are made from permanent magnet alloys. 6. A texture inducing method for alloy films, the texture inducing method comprising: providing a substrate; depositing a texture-inducing layer on the substrate, wherein the texture-inducing layer has an intrinsically crystalline texture, a texture coefficient of the texture-inducing layer is greater than 2, and a thickness of the texture-inducing layer is ranged from 0.1 μm to 6 μm; and depositing a deposition layer on the texture-inducing layer, wherein the thickness of the deposition layer is greater than that of the texture-inducing layer, and the thickness of the deposition layer is ranged from 1 μm to 60 μm; wherein the texture coefficient of the texture-inducing layer can be calculated by the following equation: T . C . ( 002 ) = I ( 002 ) / I 0 ( 002 ) 1 n ∑ [ I ( h k l )
Other phosphides · CPC title
based on cobalt · CPC title
Magnetic properties, e.g. guiding magnetic flux · CPC title
of metal (B32B15/01 takes precedence) · CPC title
containing plural metal · CPC title
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