Monolithic gas distribution manifold and various construction techniques and use cases therefor

Patent metadata

Field	Value
Publication number	US-10557197-B2
Application number	US-201514884575-A
Country	US
Kind code	B2
Filing date	Oct 15, 2015
Priority date	Oct 17, 2014
Publication date	Feb 11, 2020
Grant date	Feb 11, 2020

Abstract

A gas delivery substrate for mounting gas supply components of a gas delivery system for a semiconductor processing apparatus is provided. The substrate may include a plurality of layers having major surfaces thereof bonded together forming a laminate with openings for receiving and mounting first, second, third and fourth gas supply components on an outer major surface. The substrate may include a first gas channel extending across an interior major surface that at least partially overlaps a second gas channel extending across a different interior major surface. The substrate may include a first gas conduit including the first gas channel connecting the first gas supply component to the second gas supply component, and a second gas conduit including the second channel connecting the third gas supply component to the fourth gas supply component. Also disclosed are various techniques for manufacturing gas delivery substrates.

First claim

What is claimed is:

1. A method comprising:
obtaining a surface mount gas flow component having one or more gas flow ports;
obtaining a ceramic substrate having a first side and second side opposite the first side and including a surface-mount valve interface, the surface-mount valve interface configured to receive the surface-mount gas flow component and located on the first side, wherein the surface-mount valve interface includes a) two or more mounting holes in the ceramic substrate for receiving mounting fasteners for fixedly mounting the surface-mount gas flow component and b) one or more drop-holes, each drop-hole of the one or more drop-holes extending into the ceramic substrate and fluidically connected within the ceramic substrate with a corresponding gas flow channel that is located within the ceramic substrate and that follows a path that includes one or more segments that extend along one or more directions parallel to the first side, wherein each drop-hole of the one or more drop-holes has a corresponding seal region immediately adjacent thereto;
lapping or polishing at least each seal region of the one or more seal regions such that the surface roughness of that seal region is less than or equal to 5 μin R a ;
placing, after the lapping or polishing, a crushable metal seal around each drop-hole of the one or more drop-holes such that the crushable metal seal is in contact with the seal region immediately adjacent to that drop-hole;
placing the surface-mount gas flow component against the first side with the one or more crushable metal seals interposed between the first side and the surface mount valve component and such that each gas flow port of the one or more gas flow ports of the surface-mount gas flow component aligns with a corresponding drop-hole of the one or more drop-holes;
compressing each crushable metal seal of the one or more crushable metal seals against a corresponding seal region of the one or more seal regions.

2. The method of claim 1 , further comprising:
clamping the surface-mount gas flow component to the ceramic substrate using two or more fasteners, thereby compressing each crushable metal seal of the one or more crushable metal seals against the seal region of the one or more seal regions with which it is in contact.

3. The method of claim 2 , wherein each crushable metal seal of the one or more crushable metal seals is selected from the group consisting of: a C-seal, a W-seal, and a metal O-ring.

4. The method of claim 2 , wherein:
at least one drop-hole of the one or more drop-holes is counterbored such that the corresponding crushable metal seal is at least partially recessed within the counterbore of that drop-hole when installed, and
the seal region corresponding with the counterbored drop-hole is a floor of the counterbore.

5. The method of claim 1 , further comprising lapping or polishing the entire first side to the surface roughness less than or equal to Spin 5 μin R a .

6. The method of claim 1 , further comprising:
manufacturing the ceramic substrate;
forming a coating on at least an interior surface of each gas flow channel of the one or more gas flow channels within the ceramic substrate.

7. The method of claim 6 , wherein the manufacturing the ceramic substrate comprises:
manufacturing a plurality of ceramic layers,
forming the one or more gas flow channels in one or more of the layers,
bonding the plurality of ceramic layers together, and
sintering the bonded layers to form the ceramic substrate.

8. The method of claim 6 , wherein the coating has a thickness greater than or equal to a value selected from the group consisting of: the smallest nominal particle size of ceramic particles used to make the ceramic substrate and the maximum surface roughness exhibited by the surfaces of the one or more channels.

9. The method of claim 6 , further comprising:
applying a glaze to an interior surface of each gas flow channel of the one or more gas flow channels,
firing the ceramic substrate in a kiln or oven to melt the glaze, and
cooling the ceramic substrate to solidify the molten glaze and form the coating.

10. The method of claim 6 , further comprising:
inserting the ceramic substrate into a chemical vapor deposition (CVD) chamber, and
performing one or more CVD operations on the ceramic substrate to form the coating.

11. The method of claim 10 , further comprising:
masking, prior to performing the one or more CVD operations, portions of the first side or the second side to prevent the coating from being deposited on the masked portions.

12. The method of claim 6 , further comprising:
inserting the ceramic substrate into an atomic layer deposition (ALD) chamber, and
performing a plurality of ALD operations on the ceramic substrate to form the coating.

13. An apparatus comprising:
one or more crushable metal seals; a surface-mount gas flow component having one or more gas flow ports; and
a ceramic substrate, wherein:
the ceramic substrate has a first side and second side opposite the first side,
the ceramic substrate includes a surface-mount valve interface, the surface-mount valve interface configured to receive the surface-mount gas flow component and located on the first side, wherein the surface mount valve interface includes a) two or more mounting holes in the ceramic substrate for receiving mounting fasteners for fixedly mounting the surface-mount gas flow component and b) one or more drop-holes, each drop-hole of the one or more drop-holes extending into the ceramic substrate and fluidically connected within the ceramic substrate with a corresponding gas flow channel that is located within the ceramic substrate and that follows a path that includes one or more segments that extend along one or more directions parallel to the first side, wherein:
the surface-mount gas flow component is mounted to the ceramic substrate such that each gas flow port of the one or more gas flow ports of the surface-mount gas flow component aligns with a corresponding drop-hole of the one or more drop-holes
each crushable metal seal of the one or more crushable metal seals surrounds the corresponding drop-hole and is interposed between the surface-mount gas flow component and the ceramic substrate,
each drop-hole of the one or more drop-holes has a seal region immediately adjacent thereto that contacts with the crushable metal seal that surrounds that drop-hole,
each seal region of the one or more seal regions has a surface roughness less than or equal to 5 μin R a , and
each crushable metal seal of the one or more crushable metal seals is compressed against the seal region of the one or more seal regions with which it contacts by the surface-mount gas flow component.

14. The apparatus of claim 13 , further comprising two or more fasteners, each fastener of the two or more fasteners inserted through a corresponding mounting hole of the two or more mounting holes and tightened so as to compress the surface-mount gas flow component against the first side.

15. The apparatus of claim 13 , wherein each crushable metal seal of the one or more crushable metal seals is selected from the group consisting of: a C-seal, a W-seal, and a metal O-ring.

16. The apparatus of claim 15 , wherein the ceramic substrate further comprises at least one counterbore feature, wherein:
each counterbore feature of the at least one counterbore feature corresponds in location to one of the one or more drop-holes,
each counterbore feature of the at least one counterbore feature has a floor that includes the seal region corresponding to the drop-h

Assignees

• Lam Res Corp

Inventors

• Lee Andrew C
• Kellogg Michael C
• Pena Christopher J
• Daugherty John E

Classifications

• C23C16/4409 Primary

  characterised by sealing means · CPC title

• C23C16/4402

  Reduction of impurities in the source gas · CPC title

• C23C16/45561 Primary

  Gas plumbing upstream of the reaction chamber · CPC title

• C23C16/4404

  Coatings or surface treatment on the inside of the reaction chamber or on parts thereof · CPC title

• C23C16/045

  Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates · CPC title