Ald apparatus, method and valve
US-2020190666-A1 · Jun 18, 2020 · US
Reduction of impurities in the source gas
Reduction of impurities in the source gas · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/4402 |
| Official title | {Reduction of impurities in the source gas} |
| Display label | Reduction of impurities in the source gas |
| Total patents | 188 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 12 |
| 2016 | 14 |
| 2017 | 13 |
| 2018 | 9 |
| 2019 | 10 |
| 2020 | 17 |
| 2021 | 21 |
| 2022 | 19 |
| 2023 | 24 |
| 2024 | 14 |
| 2025 | 28 |
| 2026 | 7 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Apparatus with a valve and method of operation
US-2020181774-A1 · Jun 11, 2020 · US
Single process volume to perform high-pressure and low-pressure processes with features to reduce cross-contamination
US-2019352774-A1 · Nov 21, 2019 · US
Process for producing of polycrystalline silicon
US-10475646-B2 · Nov 12, 2019 · US
System and method for supplying a precursor for an atomic layer deposition (ALD) process
US-10443127-B2 · Oct 15, 2019 · US
Vaporizer and vaporized gas supply unit
US-2019271079-A1 · Sep 5, 2019 · US
Source reagent-based delivery of fluid with high material flux for batch deposition
US-10385452-B2 · Aug 20, 2019 · US
Enhanced charged particle beam processes for carbon removal
US-10347463-B2 · Jul 9, 2019 · US
Delivery device, manufacturing system and process of manufacturing
US-10316408-B2 · Jun 11, 2019 · US
Low vapor pressure chemical delivery
US-2019119813-A1 · Apr 25, 2019 · US
Tubular electrostatic device
US-2019078204-A1 · Mar 14, 2019 · US
Atomic layer deposition processing chamber permitting low-pressure tool replacement
US-10184179-B2 · Jan 22, 2019 · US
High purity tungsten hexachloride and method for making same
US-10100406-B2 · Oct 16, 2018 · US
Substrate processing apparatus, vaporization system and mist filter
US-2018274093-A1 · Sep 27, 2018 · US
Process for Producing of Polycrystalline Silicon
US-2018226249-A1 · Aug 9, 2018 · US
Precursor control system and process
US-2018163307-A1 · Jun 14, 2018 · US
Enhanced charged particle beam processes for carbon removal
US-2018166272-A1 · Jun 14, 2018 · US
Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatus
US-2018127868-A1 · May 10, 2018 · US
Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatus
US-9873940-B2 · Jan 23, 2018 · US
Solid precursor delivery method using liquid solvent for thin film deposition
US-9869018-B2 · Jan 16, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/4402?
- CPC C23C16/4402 is the Cooperative Patent Classification code for “Reduction of impurities in the source gas.”
- How many patents are filed under CPC C23C16/4402 (Reduction of impurities in the source gas)?
- Our database includes 188 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/4402 growing?
- Publication counts under this code: 14 in 2024 vs 28 in 2025 (latest complete years).