Plasma processing apparatus

Patent metadata

Field	Value
Publication number	US-10504698-B2
Application number	US-201514868554-A
Country	US
Kind code	B2
Filing date	Sep 29, 2015
Priority date	Oct 27, 2014
Publication date	Dec 10, 2019
Grant date	Dec 10, 2019

Abstract

A plasma processing apparatus is provided that is configured to supply a gas into a chamber, generate a plasma from the gas using a power of an electromagnetic wave, and perform a predetermined plasma process on a substrate that is held by a mounting table. The plasma processing apparatus includes a dielectric window through which the electromagnetic wave that is output from an electromagnetic wave generator is propagated and transmitted into the chamber, a support member that supports the dielectric window, a partition member that separates a space where the support member is arranged from a plasma generation space and includes a protrusion abutting against the dielectric window, and a conductive member that is arranged between the partition member and the dielectric window and is protected from being exposed to the plasma generation space by the protrusion.

First claim

What is claimed is:

1. A plasma processing apparatus configured to supply a gas into a chamber, generate a plasma from the gas using a power of an electromagnetic wave, and perform a predetermined plasma process on a substrate that is held by a mounting table, the plasma processing apparatus comprising:
a chamber in which plasma is generated;
a dielectric window through which the electromagnetic wave that is output from an electromagnetic wave generator is propagated and transmitted into the chamber;
a support that supports the dielectric window;
a partition arranged below the dielectric window, the partition separating a space where the support is arranged from a plasma generation space in the chamber, and including a protrusion abutting against the dielectric window; and
a conductive ring formed of silicon that is arranged between the partition and the dielectric window, and an inner diameter side of the conductive ring is covered by the protrusion to protect the conductive ring from being exposed to the plasma generation space, wherein a gap between the protrusion and the conductive plate is arranged to have a distance of less than 0.68 mm.

2. The plasma processing apparatus according to claim 1 , wherein the partition member is L-shaped, and an inner corner of the L-shaped partition member is arranged to be close to the conductive ring.

3. The plasma processing apparatus according to claim 1 , further comprising:
an installation ring that is arranged to extend below the support, and a gap is provided between the partition and the installation ring.

4. The plasma processing apparatus according to claim 1 , wherein the conductive ring is connected to ground.

5. The plasma processing apparatus according to claim 1 , further comprising:
a focus ring that is arranged at an outer edge side of the mounting table; and
a conductive film that is arranged on at least one of a front surface or a back surface of the focus ring.

6. The plasma processing apparatus according to claim 5 , wherein the conductive film is connected to ground.

7. The plasma processing apparatus according to claim 1 , wherein the gap is provided in a ring-shape, and is positioned between the protrusion of the partition and a plasma generation space side of the conductive ring.

8. A plasma processing apparatus configured to supply a gas into a chamber, generate a plasma from the gas using a power of an electromagnetic wave, and perform a predetermined plasma process on a substrate that is held by a mounting table, the plasma processing apparatus comprising:
a chamber in which plasma is generated;
a dielectric window through which the electromagnetic wave that is output from an electromagnetic wave generator is propagated and transmitted into the chamber;
a support that supports the dielectric window;
a partition arranged below the dielectric window, the partition separating a space where the support is arranged from a plasma generation space in the chamber, and including a protrusion abutting against the dielectric window; and
a conductive ring formed of SiO2 that is arranged between the partition and the dielectric window and is protected from being exposed to the plasma generation space by the protrusion wherein a gap between the protrusion and the conductive ring is arranged to have a distance less than 0.39 mm.

Assignees

• Tokyo Electron Ltd

Inventors

• Kohno Masayuki
• Son Ryou
• Matsumoto Naoki
• Yoshikawa Jun
• Aita Michitaka
• Shimizu Ippei
• Yoshida Yusuke
• Koyama Koji
• Sudayama Masami
• Aramaki Yukiyoshi

Classifications

• H01J37/32192 Primary

  Microwave generated discharge (H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence) · CPC title

• H01J37/32266

  Means for controlling power transmitted to the plasma · CPC title

• H01J37/32944

  Arc detection · CPC title