Electrochemical doping of thin metal layers employing underpotential deposition and thermal treatment

Patent metadata

Field	Value
Publication number	US-10501846-B2
Application number	US-201715701265-A
Country	US
Kind code	B2
Filing date	Sep 11, 2017
Priority date	Sep 11, 2017
Publication date	Dec 10, 2019
Grant date	Dec 10, 2019

Abstract

A method is provided, including the following operations: depositing a ruthenium liner in a feature of a substrate; depositing a monolayer of zinc over the ruthenium liner; after depositing the monolayer of zinc, performing a thermal treatment on the substrate, wherein the thermal treatment is configured to cause migration of the zinc to an interface of the ruthenium liner and an oxide layer of the substrate, the migration of the zinc producing an adhesive barrier at the interface that improves adhesion between the ruthenium liner and the oxide layer of the substrate; repeating the operations of depositing the monolayer of zinc and performing the thermal treatment until a predefined number of cycles is reached.

First claim

What is claimed is:

1. A method, comprising:
depositing a ruthenium liner in a feature of a substrate;
depositing a monolayer of zinc over the ruthenium liner;
after depositing the monolayer of zinc, performing a thermal treatment on the substrate, wherein the thermal treatment is configured to cause migration of the zinc to an interface of the ruthenium liner and an oxide layer of the substrate, the migration of the zinc producing an adhesive barrier at the interface that improves adhesion between the ruthenium liner and the oxide layer of the substrate;
repeating the operations of depositing the monolayer of zinc and performing the thermal treatment until a predefined number of cycles is reached.

2. The method of claim 1 , wherein depositing the monolayer of zinc is performed by an underpotential deposition process, the underpotential deposition process including deposition from a plating solution at a potential that avoids electroplating from the plating solution.

3. The method of claim 1 , wherein depositing the monolayer of zinc is performed by an electroless underpotential deposition process.

4. The method of claim 1 , wherein the thermal treatment is defined by annealing at a temperature of approximately 100 to 400 C.

5. The method of claim 1 , wherein the predefined number of cycles is approximately 3 to 10 cycles.

6. The method of claim 1 , wherein the thermal treatment causes bonding of at least a portion of the zinc to oxygen at the interface to form the adhesive barrier.

7. The method of claim 1 , wherein the migration of the zinc causes at least a portion of the zinc to fill grain boundaries of the ruthenium liner that are along the interface.

8. The method of claim 1 , wherein the feature does not include an adhesive layer prior to the deposition of the ruthenium liner.

9. The method of claim 1 , wherein the feature defines an interconnect to an underlying conductor, wherein a portion of the ruthenium liner contacts the underlying conductor.

10. The method of claim 1 , further comprising:
after the predefined number of cycles is reached, depositing a conductive material over the ruthenium liner to fill the feature of the substrate.

11. The method of claim 10 , wherein the conductive material includes copper, cobalt, or ruthenium.

Assignees

• Lam Res Corp

Inventors

• Venkatraman Kailash
• Dordi Yezdi
• Joi Aniruddha

Classifications

• H10W20/0552

  by diffusing metallic dopants to react with dielectrics · CPC title

• H10W20/4437

  the principal metal being a transition metal · CPC title

• C23C18/38

  Coating with copper · CPC title

• C23C16/06

  characterised by the deposition of metallic material · CPC title

• C23C18/1653

  Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating · CPC title