Gas distribution for chemical vapor deposition/infiltration

Patent metadata

Field	Value
Publication number	US-10480065-B2
Application number	US-201715709338-A
Country	US
Kind code	B2
Filing date	Sep 19, 2017
Priority date	Sep 19, 2017
Publication date	Nov 19, 2019
Grant date	Nov 19, 2019

Abstract

A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.

First claim

What is claimed is:

1. A gas distribution plate for a chemical vapor deposition/infiltration system, the gas distribution plate comprising:
a body comprising a first side and a second side opposite the first side, wherein the body is hollow and defines an internal cavity;
a plurality of pass-through tubes extending through the internal cavity, wherein each pass-through tube of the plurality of pass-through tubes extends from a first opening defined in the first side of the body to a second opening defined in the second side, wherein a reaction gas is configured to flow through the plurality of pass-through tubes; and
a cavity inlet defined in the first side of the body, wherein a gaseous mitigation agent is configured to flow into the internal cavity of the body via the cavity inlet; and
a plurality of cavity outlets defined in the second side of the body, wherein the gaseous mitigation agent is configured flow out the internal cavity via the plurality of cavity outlets;
wherein the body comprises a conical distribution feature having a base and an apex, wherein the base is flush with and extends from the second side of the body and the apex protrudes into the internal cavity directly opposite the cavity inlet.

2. The gas distribution plate of claim 1 , wherein the reaction gas in the plurality of pass-through tubes is isolated from the gaseous mitigation agent in the internal cavity.

3. The gas distribution plate of claim 1 , wherein the plurality of cavity outlets are distributed among the second opening of the plurality of pass-through tubes.

4. The gas distribution plate of claim 1 , further comprising a plurality of static mixing features extending from the second side of the gas distribution plate, wherein each static mixing feature of the plurality of static mixing features comprises a portion aligned with, disposed a distance from, and extending over a respective cavity outlet of the plurality of cavity outlets.

5. The gas distribution plate of claim 4 , wherein each static mixing feature of the plurality of static mixing features is “T” shaped.

6. The gas distribution plate of claim 1 , wherein the base of the conical distribution feature defines a footprint on the second side of the body, wherein the footprint is solid such that the second side of the body comprises a region, corresponding to the footprint of the conical distribution feature, that does not have any of the cavity outlets or the pass-through tubes.

7. The gas distribution plate of claim 1 , wherein the plurality of cavity outlets and the second opening of the plurality of pass-through tubes are disposed outward of a footprint of the conical distribution feature on the second side of the body.

Assignees

• Goodrich Corp

Inventors

• She Ying
• Menon Naveen G
• Dardas Zissis A
• Filburn Thomas P
• Cai Xiaodan

Classifications

• C04B2235/483

  Si-containing organic compounds, e.g. silicone resins, (poly)silanes, (poly)siloxanes or (poly)silazanes · CPC title

• C23C16/45574

  Nozzles for more than one gas · CPC title

• C04B2235/444

  Halide containing anions, e.g. bromide, iodate, chlorite · CPC title

• C23C16/45502

  Flow conditions in reaction chamber · CPC title

• C23C16/4405

  Cleaning of reactor or parts inside the reactor by using reactive gases · CPC title