Plasma nitriding apparatus

US10443117B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10443117-B2
Application numberUS-201615172507-A
CountryUS
Kind codeB2
Filing dateJun 3, 2016
Priority dateDec 18, 2013
Publication dateOct 15, 2019
Grant dateOct 15, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A plasma nitriding apparatus includes: a surface treatment unit which includes a treatment tank to house part of a treatment object inclusive of a surface treatment region, and performs a nitriding treatment on the surface treatment region inside of the treatment tank by using plasma of a treatment gas; and an outer container which receives supply of the treatment gas, and houses the treatment object and the treatment tank so that a region of the treatment object other than the part is exposed from the treatment tank.

First claim

Opening claim text (preview).

What is claimed is: 1. A plasma nitriding apparatus comprising: a surface treatment unit including a treatment tank configured to receive supply of a treatment gas and house part of a treatment object inclusive of a surface treatment region, and the surface treatment unit is configured to perform a nitriding treatment on the surface treatment region inside of the treatment tank by using plasma of the treatment gas; an electrode disposed in the treatment tank and opposed to the surface treatment region to produce the plasma between the electrode and the treatment object and an outer container as a vacuum chamber, the outer container configured to house whole of the treatment object and the treatment tank while a region of the treatment object other than the part is exposed from the treatment tank, wherein the outer container includes a lower container which houses the treatment tank and an upper container which houses the region of the treatment object that is exposed from the treatment tank, the lower container and the upper container each including flanges which are fastened to each other when the upper container is fixed to the lower container, further comprising an attachment jig which supports the treatment object, the attachment jig including a cover into which the treatment object is inserted, a disc which supports an upper end of the cover, and guide rods which define a height in a vertical direction of the surface treatment region relative to the electrode, wherein an upper end of each of the guide rods is fixed to a portion of the disc and a positioning hole is formed in a lower end of each of the guide rods, each positioning hole cooperating with a positioning pin fixed to the flange of the lower container. 2. The plasma nitriding apparatus according to claim 1 , wherein the surface treatment unit comprises a heating unit configured to heat the surface treatment region. 3. The plasma nitriding apparatus according to claim 2 , wherein the heating unit is an electric heater disposed on a side surface of the treatment tank away from the surface treatment region. 4. The plasma nitriding apparatus according to claim 1 , wherein the electrode is cylindrical around the treatment object as a center. 5. The plasma nitriding apparatus according to claim 2 , further comprising a heat insulation material that covers a side surface of the treatment tank.

Assignees

Inventors

Classifications

  • Relative arrangement or disposition of electrodes; moving means · CPC title

  • Treatment of selected surface areas, e.g. using masks · CPC title

  • Temperature · CPC title

  • C23C8/36Primary

    using ionised gases, e.g. ionitriding · CPC title

  • Nitriding · CPC title

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Frequently asked questions

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What does patent US10443117B2 cover?
A plasma nitriding apparatus includes: a surface treatment unit which includes a treatment tank to house part of a treatment object inclusive of a surface treatment region, and performs a nitriding treatment on the surface treatment region inside of the treatment tank by using plasma of a treatment gas; and an outer container which receives supply of the treatment gas, and houses the treatment …
Who is the assignee on this patent?
Ihi Corp
What technology area does this patent fall under?
Primary CPC classification C23C8/36. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 15 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).