Source reagent-based delivery of fluid with high material flux for batch deposition

Patent metadata

Field	Value
Publication number	US-10385452-B2
Application number	US-201314404633-A
Country	US
Kind code	B2
Filing date	May 31, 2013
Priority date	May 31, 2012
Publication date	Aug 20, 2019
Grant date	Aug 20, 2019

Abstract

Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel having one or more interior walls enclosing an interior volume and a plurality of reagent support trays configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between adjacent reagent support trays in the stack of reagent support trays to cause the flow of gas to interact with the source reagent material in a particular reagent support tray before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.

First claim

What is claimed is:

1. A system comprising:
a vaporizer vessel having one or more interior walls and a lid enclosing an interior volume;
an inlet port and an outlet port associated with said lid for a flow of carrier gas;
a plurality of reagent support trays within said interior volume, wherein each of the plurality of reagent support trays is configured to engage the one or more interior walls and to engage a downtube coupled to the inlet port, the support tray including an opening through which the downtube extends, the downtube enabling the flow of carrier gas to be introduced below a lowermost of the plurality of reagent support trays, and wherein:
each of the plurality of reagent support trays includes a support surface having a top face configured to support a supply of source reagent material and a bottom face, and one or more channels that extend through the support surface;
each of the plurality of reagent support trays further includes a sidewall extending from a lower edge to an upper edge in a vertical direction away from the support surface and surrounds an outer periphery of the support surface, wherein the sidewall is configured to engage the one or more interior walls along the outer periphery of the support surface and wherein the lower edge of the sidewall of a particular reagent support tray of the plurality of reagent support trays is configured to engage the upper edge of the sidewall of a subjacent reagent support tray of the plurality of reagent support trays;
each of the plurality of reagent support trays has a height measured from the bottom edge of the support surface to the uppermost edge of the sidewall, wherein at least two reagent support trays of the plurality of reagent support trays have different heights; and
the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays, wherein one or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between two or more adjacent reagent support trays in the stack of reagent support trays so as to cause the flow of gas to interact with the supply of source reagent material in one of the plurality of reagent support trays in the stack of reagent support trays before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.

2. The system of claim 1 , wherein each of the plurality of reagent support trays includes at least one divider extending at least partially across the support surface, the at least one divider having a lower end extending a first distance below the bottom face, and an upper end, and at least one channel extending through the at least one divider between the lower end and the upper end, wherein gas below the bottom edge is forced to circulate away from the bottom face to reach the at least one channel at the lower end of the at least one divider.

3. The system of claim 2 , wherein each of the plurality of reagent support trays is configured to closely engage the one or more interior walls such that the at least one channel of the at least one divider provides an only passage for the gas to flow from below the bottom face to above the top face.

4. The system of claim 2 , wherein upon the subjacent reagent support tray being vertically stacked beneath the particular reagent support tray, the at least one divider of the subjacent reagent support tray is configured to be offset from the at least one divider of the particular reagent support tray such that a flow of the gas below the bottom edge of the subjacent reagent support tray that passes through the at least one channel of the at least one divider of the subjacent reagent support tray does not flow linearly into the at least one channel of the at least one divider of the particular reagent support tray.

5. The system of claim 4 , wherein upon the subjacent reagent support tray being vertically stacked beneath the particular reagent support tray, a subjacent upper end of the at least one divider of the subjacent reagent support tray extends to within a second distance of the bottom edge of the support surface of the particular reagent support tray, and wherein the first distance is greater than the second distance such that the flow of the gas passing from the at least one channel of the at least one divider of the subjacent reagent support tray must circulate away from the bottom edge of the particular reagent support tray to reach the at least one channel at the lower end of the at least one divider of the particular reagent support tray.

6. The system of claim 2 , wherein the at least one divider is generally hollow such that the at least one channel includes a slot extending through the at least one divider.

7. The system of claim 2 , wherein the at least one divider includes a plurality of bores extending therethrough, wherein the plurality of bores form a plurality of generally parallel channels extending through each of the plurality of dividers.

8. The system of claim 2 , wherein at least one of the plurality of reagent support trays includes at least one divider extending fully across the support surface.

9. The system of claim 2 , wherein the at least one reagent support tray includes at least one divider extending partially across the support surface.

10. The system of claim 2 , wherein the at least one reagent support tray includes at least one divider having generally parallel sides in a plane defined by the support surface.

11. The system of claim 2 , wherein the at least one reagent support tray includes at least one divider having nonparallel sides in a plane defined by the support surface.

12. The system of claim 2 , wherein the at least one reagent support tray includes at least one divider extending fully across the support surface and the support tray includes no dividers extending only partially across the support surface.

13. The system of claim 2 , wherein each of the plurality of reagent support trays includes an opening configured to permit a tube to extend through the at least one divider and the support surface, wherein the tube is configured to flow a carrier gas either from a top portion of the vaporizer vessel to a lower portion of the interior volume of the vaporizer vessel, or from a lower portion of the interior volume of the vaporizer vessel to a top portion of the vaporizer vessel.

14. The system of claim 1 where reagent support trays which are positioned at a lowermost end of the stack of reagent support trays have a first height that is greater than a second height of reagent support trays which are positioned at an uppermost end of the stack or reagent support trays.

15. The system of claim 1 where reagent support trays which are positioned at a lowermost end of the stack of reagent support trays have a first height that is greater than a second height of reagent support trays which are positioned at an uppermost end of the stack of reagent support trays, said one or more channels extend through the support surface to convey a flow of gas from below the support surface into a volume above the reagent support tray.

16. The system of claim 1 , further comprising at least one particle suppression device within the vaporizer vessel, wherein the at least one particle suppression device is positioned between the plurality of reagent support trays and the outlet port, and wherein the at least one particle suppression device is configured so that the carrier gas passes through the at least one particle suppression device before reaching the outlet port.

Assignees

• Entegris Inc

Inventors

• Hendrix Bryan C
• Gregg John N
• Battle Scott L
• Naito Donn K
• Bartosh Kyle
• Cleary John M
• Cheon Sebum
• Hodges Jordan

Classifications

• C23C16/4481

  by evaporation using carrier gas in contact with the source material (C23C16/4486 takes precedence) · CPC title

• C23C16/4402

  Reduction of impurities in the source gas · CPC title

• C23C16/458 Primary

  characterised by the method used for supporting substrates in the reaction chamber · CPC title

• C23C16/455

  characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber · CPC title

• B01B1/005 Primary

  Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions · CPC title