Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography

Patent metadata

Field	Value
Publication number	US-10347486-B1
Application number	US-201715846942-A
Country	US
Kind code	B1
Filing date	Dec 19, 2017
Priority date	Dec 19, 2017
Publication date	Jul 9, 2019
Grant date	Jul 9, 2019

Abstract

A lithographic patterning method includes forming a multi-layer patterning material film stack on a semiconductor substrate, the patterning material film stack including a resist layer formed over one or more additional layers, and forming a metal-containing top coat over the resist layer. The method further includes exposing the multi-layer patterning material film stack to patterning radiation through the metal-containing top coat to form a desired pattern in the resist layer, removing the metal-containing top coat, developing the pattern formed in the resist layer, etching at least one underlying layer in accordance with the developed pattern, and removing remaining portions of the resist layer. The metal-containing top coat can be formed, for example, by atomic layer deposition or spin-on deposition over the resist layer, or by self-segregation from the resist layer.

First claim

What is claimed is:

1. A lithographic patterning method, comprising:
forming a multi-layer patterning material film stack on a semiconductor substrate, the patterning material film stack comprising a resist layer formed over one or more additional layers;
forming a metal-containing top coat over the resist layer;
exposing the multi-layer patterning material film stack to patterning radiation through the metal-containing top coat to form a desired pattern in the resist layer;
removing the metal-containing top coat;
developing the pattern formed in the resist layer;
etching at least one underlying layer in accordance with the developed pattern; and
removing remaining portions of the resist layer;
wherein forming the metal-containing top coat over the resist layer comprises forming the metal-containing top coat utilizing a process of self-segregation from the resist layer.

2. The method of claim 1 wherein the one or more additional layers of the patterning material film stack comprise at least one of:
a hard mask layer; and
an organic planarizing layer.

3. The method of claim 2 wherein etching at least one underlying layer in accordance with the developed pattern comprises etching the hard mask layer.

4. The method of claim 1 wherein forming the metal-containing top coat over the resist layer comprises forming the metal-containing top coat over the resist layer utilizing a deposition process.

5. The method of claim 4 wherein the deposition process utilized to form the metal-containing top coat comprises an atomic layer deposition process.

6. The method of claim 4 wherein the deposition process utilized to form the metal-containing top coat comprises a spin-on deposition process.

7. The method of claim 1 wherein forming the metal-containing top coat utilizing a process of self-segregation from the resist layer comprises:
providing a self-segregating material in a resist mixture used to form the resist layer;
utilizing the resist mixture to form the resist layer; and
subjecting the resist layer to a designated process to cause the self-segregating material to self-segregate from the resist layer to form the metal-containing top coat.

8. The method of claim 7 wherein the self-segregating material comprises a fluorine functionalized metal additive.

9. The method of claim 7 wherein the designated process that causes the self-segregating material to self-segregate from the resist layer to form the metal-containing top coat comprises a post-application bake process.

10. The method of claim 1 wherein the metal-containing top coat comprises at least one of a transition metal and a post-transition metal.

11. The method of claim 10 wherein the metal-containing top coat comprises at least one transition metal and said at least one transition metal comprises at least one of hafnium (Hf), zirconium (Zr), tantalum (Ta), tungsten (W), chromium (Cr), cobalt (Co), iron (Fe) and platinum (Pt).

12. The method of claim 10 wherein the metal-containing top coat comprises at least one post-transition metal and said at least one post-transition metal comprises tin (Sn).

13. The method of claim 10 wherein the metal-containing top coat further comprises at least one metalloid and said at least one metalloid comprises antimony (Sb).

14. The method of claim 1 wherein the metal-containing top coat comprises a metal oxide.

15. A lithographic patterning method, comprising:
forming a multi-layer patterning material film stack on a semiconductor substrate, the patterning material film stack comprising a resist layer formed over one or more additional layers;
forming a metal-containing top coat over the resist layer;
exposing the multi-layer patterning material film stack to patterning radiation through the metal-containing top coat to form a desired pattern in the resist layer;
removing the metal-containing top coat;
developing the pattern formed in the resist layer;
etching at least one underlying layer in accordance with the developed pattern; and
removing remaining portions of the resist layer;
wherein the metal-containing top coat is soluble in a developer solution used in developing the pattern formed in the resist layer.

16. The method of claim 1 wherein removing the metal-containing top coat comprises removing the metal-containing top coat as part of developing the pattern formed in the resist layer.

17. The method of claim 15 wherein the metal-containing top coat comprises at least one of a transition metal and a post-transition metal.

18. The method of claim 17 wherein the metal-containing top coat comprises at least one transition metal and said at least one transition metal comprises at least one of hafnium (Hf), zirconium (Zr), tantalum (Ta), tungsten (W), chromium (Cr), cobalt (Co), iron (Fe) and platinum (Pt).

19. The method of claim 17 wherein the metal-containing top coat comprises at least one post-transition metal and said at least one post-transition metal comprises tin (Sn).

20. The method of claim 17 wherein the metal-containing top coat further comprises at least one metalloid and said at least one metalloid comprises antimony (Sb).

Assignees

• IBM

Inventors

• De Silva Ekmini Anuja
• Goldfarb Dario
• Felix Nelson
• Corliss Daniel
• Wojtecki Rudy J

Classifications

• H10P76/405

  characterised by their composition, e.g. multilayer masks · CPC title

• H10P76/4085

  characterised by the processes involved to create the masks · CPC title

• H10P76/4083

  characterised by their behaviours during the lithography processes, e.g. soluble masks or redeposited masks · CPC title

• H10P76/204

  of organic photoresist masks · CPC title

• H10P50/692

  characterised by their composition, e.g. multilayer masks or materials · CPC title