Microlithographic projection exposure apparatus and measuring device for a projection lens

Patent metadata

Field	Value
Publication number	US-10345710-B2
Application number	US-201615250241-A
Country	US
Kind code	B2
Filing date	Aug 29, 2016
Priority date	Jan 20, 2004
Publication date	Jul 9, 2019
Grant date	Jul 9, 2019

Abstract

A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

First claim

The invention claimed is:

1. An apparatus, comprising:
an illumination system configured to produce projection light;
a projection lens comprising a plurality of optical elements; and
a conduit,
wherein:
the projection lens is configured to image an object in an object plane of the projection lens onto an image plane of the projection lens;
an immersion space is disposed between the projection lens and the image plane of the projection lens;
the immersion space is fillable with an immersion liquid;
an evaporation barrier is disposed between the projection lens and the image plane of the projection lens;
the evaporation barrier laterally delimits the immersion space so that, when an immersion liquid is present in the immersion space, the evaporation barrier contacts the immersion liquid;
a gap is present between the evaporation barrier and the image plane of the projection lens;
the gap is configured so that, when the immersion liquid is present in the immersion zone, adhesive forces prevent the immersion liquid from passing through the gap;
the conduit is inside the evaporation barrier;
the conduit is configured to allow a flow of a medium in a plane that is at least substantially parallel to the image plane of the projection lens; and
the apparatus is a microlithographic projection apparatus.

2. The apparatus of claim 1 , wherein at least a portion of the conduit is bent.

3. The apparatus of claim 1 , wherein at least a portion of the conduit is annular.

4. The apparatus of claim 1 , wherein the conduit defines a flow direction that is at least substantially parallel to an inner surface of the evaporation barrier.

5. The apparatus of claim 4 , wherein the inner surface is cylindrical.

6. The apparatus of claim 1 , wherein the conduit is tubular.

7. The apparatus of claim 1 , wherein the evaporation barrier is fixed to an underside of the projection lens.

8. The apparatus of claim 1 , wherein the evaporation barrier is ring-shaped.

9. The apparatus of claim 1 , further comprising an immersion liquid in the immersion space.

10. The apparatus of claim 9 , further comprising a photosensitive material in the image plane of the projection lens, wherein the object is a mask.

11. A method, comprising:
providing the apparatus of claim 1 ;
disposing an immersion liquid in the immersion space;
using the illumination system to illuminate a mask in the object plane of the projection lens; and
using the projection lens to image a portion of the mask onto a photosensitive material in the image plane of the projection lens.

12. The method of claim 11 , wherein at least a portion of the conduit is bent.

13. The method of claim 11 , wherein at least a portion of the conduit is annular.

14. The method of claim 11 , wherein the conduit defines a flow direction that is at least substantially parallel to an inner surface of the evaporation barrier.

15. The method of claim 14 , wherein the inner surface is cylindrical.

16. The method of claim 11 , wherein the conduit is tubular.

17. The method of claim 11 , wherein the evaporation barrier is fixed to an underside of the projection lens.

18. The method of claim 11 , wherein the evaporation barrier is ring-shaped.

19. The apparatus of claim 1 , wherein the gap is between the projection lens and the image plane.

20. The apparatus of claim 1 , wherein the gap is above the image plane of the projection lens.

21. An apparatus, comprising:
an illumination system configured to produce projection light;
a projection lens comprising a plurality of optical elements;
a conduit having a bent portion;
an immersion liquid in an immersion space between the illumination system and the projection lens;
a mask in an object plane of the projection lens; and
a photosensitive material in an image plane of the projection lens,
wherein:
the projection lens is configured to image at least a portion of the mask onto the photosensitive material;
an evaporation barrier is disposed between the projection lens and the photosensitive material;
the evaporation barrier is fixed to an underside of the projection lens;
the evaporation barrier laterally delimits the immersion space so that the evaporation barrier contacts the immersion liquid;
a gap is present between the evaporation barrier and the photosensitive material;
the gap is configured so that, when the immersion liquid is present in the immersion zone, adhesive forces prevent the immersion liquid from passing through the gap;
the conduit is inside the evaporation barrier;
the conduit is configured to allow a flow of a medium in a plane that is at least substantially parallel to the image plane of the projection lens;
the conduit defines a flow direction that is at least substantially parallel to an inner surface of the evaporation barrier; and
the apparatus is a microlithographic projection apparatus.

22. A method, comprising:
providing the apparatus of claim 21 ;
using the illumination system to illuminate the mask; and
using the projection lens to image a portion of the mask onto the photosensitive material.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Ehrmann Albrecht
• Wegmann Ulrich
• Hoch Rainer
• Mallmann Joerg
• Schuster Karl-Heinz
• Loering Ulrich
• Gruner Toralf
• Kneer Bernhard
• Geuppert Bernhard
• Sorg Franz
• Kugler Jens
• Wabra Norbert

Classifications

• G03F7/70875

  Temperature, e.g. temperature control of masks or workpieces via control of stage temperature · CPC title

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• G03F7/70991

  Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum · CPC title

• G03F7/70691

  Handling of masks or workpieces · CPC title

• G03F7/70591

  Testing optical components · CPC title