Method for producing an optical imaging system for a microlithography apparatus
US-2026072364-A1 · Mar 12, 2026 · US
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Gruner Toralf patents
Gruner Toralf is listed as an inventor on 131 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Gruner Toralf |
| Total patents | 131 |
| First publication | Jan 15, 2015 |
| Latest publication | Mar 12, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Optical system, and method for operating an optical system
US-12571983-B2 · Mar 10, 2026 · US
Apparatus and method for checking a component, and lithography system
US-2026044068-A1 · Feb 12, 2026 · US
Optical modules for the ultraviolet wavelength range
US-2025389927-A1 · Dec 25, 2025 · US
Projection exposure apparatus for semiconductor lithography
US-12436361-B2 · Oct 7, 2025 · US
Projection objective including an optical device
US-12411417-B2 · Sep 9, 2025 · US
Method for operating a projection exposure system
US-2025216792-A1 · Jul 3, 2025 · US
Facet assembly for a facet mirror
US-12339587-B2 · Jun 24, 2025 · US
Support for an optical element
US-12271117-B2 · Apr 8, 2025 · US
Stop, optical system and lithography apparatus
US-12222655-B2 · Feb 11, 2025 · US
Recent patents
Latest publications not already listed above.
Optical component for a lithography apparatus
US-2025044712-A1 · Feb 6, 2025 · US
Mirror, in particular for a microlithographic projection exposure apparatus
US-12210289-B2 · Jan 28, 2025 · US
Method for producing a temperature-controlling hollow structure in a substrate using a processing light beam
US-2024416461-A1 · Dec 19, 2024 · US
Optical system, projection exposure system and method
US-2024288784-A1 · Aug 29, 2024 · US
Method and device for characterizing the surface shape of an optical element
US-11927500-B2 · Mar 12, 2024 · US
Projection exposure method and projection lens with setting of the pupil transmission
US-11906904-B2 · Feb 20, 2024 · US
Method of setting up a projection exposure system, a projection exposure method and a projection exposure system for microlithography
US-2023367231-A1 · Nov 16, 2023 · US
Mirror, in particular for a microlithographic projection exposure apparatus
US-11809085-B2 · Nov 7, 2023 · US
Optical system, and method for operating an optical system
US-2023324648-A1 · Oct 12, 2023 · US
Mirror, optical system and method for operating an optical system
US-2023305290-A1 · Sep 28, 2023 · US
Support for an optical element
US-2023236516-A1 · Jul 27, 2023 · US
Optical system and method of operating an optical system
US-2023176492-A1 · Jun 8, 2023 · US
A projection objective including an optical device
US-2023142187-A1 · May 11, 2023 · US
Mirror, in particular for a microlithographic projection exposure apparatus
US-2023122333-A1 · Apr 20, 2023 · US
Facet assembly for a facet mirror
US-2023026528-A1 · Jan 26, 2023 · US
Projection exposure apparatus for semiconductor lithography
US-2022299733-A1 · Sep 22, 2022 · US
Projection exposure apparatus for semiconductor lithography
US-2022260924-A1 · Aug 18, 2022 · US
Compensation of creep effects in an imaging device
US-11415895-B2 · Aug 16, 2022 · US
Method and device for characterizing the surface shape of an optical element
US-2022236139-A1 · Jul 28, 2022 · US
Assembly in an optical system, in particular of a microlithographic projection exposure apparatus
US-2022214627-A1 · Jul 7, 2022 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 131 |
| Gruner Toralf | 7 |
| Feldmann Heiko | 3 |
| Epple Alexander | 2 |
| Asml Netherlands Bv | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70266 | 53 |
| G03F7/70308 | 37 |
| G03F7/70316 | 36 |
| G03F7/70258 | 34 |
| G03F7/70891 | 34 |