Cleaning formulation for removing residues on surfaces

Patent metadata

Field	Value
Publication number	US-10253282-B2
Application number	US-201615386178-A
Country	US
Kind code	B2
Filing date	Dec 21, 2016
Priority date	Dec 6, 2013
Publication date	Apr 9, 2019
Grant date	Apr 9, 2019

Abstract

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one second chelating agent different from the first chelating agent, the second chelating agent containing at least two nitrogen-containing groups; 4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 5) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 6) water; and 7) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.

First claim

What is claimed is:

1. A cleaning composition, consisting of:
1) at least one redox agent;
2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid;
3) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole;
4) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers;
5) water; and
6) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion.

2. The composition of claim 1 , wherein the pH of the composition is between about 6 and about 11.

3. The composition of claim 1 , wherein the at least one redox agent comprises hydroxylamine.

4. The composition of claim 1 , wherein the at least one redox agent is from about 0.5% to about 20% by weight of the composition.

5. The composition of claim 1 , wherein the polyaminopolycarboxylic acid is selected from the ground consisting of mono- or polyalkylene polyamine polycarboxylic acids, polyaminoalkane polycarboxylic acids, polyaminoalkanol polycarboxylic acids, and hydroxyalkylether polyamine polycarboxylic acids.

6. The composition of claim 5 , wherein the polyaminopolycarboxylic acid is diethylenetriamine pentaacetic acid.

7. The composition of claim 1 , wherein the polyaminopolycarboxylic acid is from about 0.01% to about 1% by weight of the composition.

8. The composition of claim 1 , wherein the at least one metal corrosion inhibitor comprises a benzotriazole optionally substituted by at least one substituent selected from the group consisting of alkyl groups, aryl groups, halogen groups, amino groups, nitro groups, alkoxy groups, and hydroxyl groups.

9. The composition of claim 8 , wherein the at least one metal corrosion inhibitor comprises 5-methylbenzotriazole.

10. The composition of claim 1 , wherein the at least one metal corrosion inhibitor is from about 0.05% to about 1% by weight of the composition.

11. The composition of claim 1 , wherein the at least one organic solvent comprises ethylene glycol butyl ether.

12. The composition of claim 1 , wherein the at least one organic solvent is from about 1% to about 30% by weight of the composition.

13. The composition of claim 1 , further comprising at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion.

14. The composition of claim 13 , wherein the at least one pH adjusting agent comprises 1,8-diazabicyclo[5.4.0]undec-7-ene.

15. The composition of claim 13 , wherein the at least one pH adjusting agent is from about 0.1% to about 3% by weight of the composition.

16. The composition of claim 1 , wherein the composition consists of hydroxylamine, diethylenetriamine pentaacetic acid, 5-methylbenzotriazole, 1,8-diazabicyclo[5.4.0]undec-7-ene, ethylene glycol butyl ether, and water.

17. A cleaning composition, comprising:
1) at least one redox agent;
2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid;
3) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole;
4) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers;
5) water; and
6) 1,8-diazabicyclo[5.4.0]undec-7-ene.

18. The composition of claim 17 , wherein the pH of the composition is between about 6 and about 11.

19. The composition of claim 17 , wherein the at least one redox agent comprises hydroxylamine.

20. The composition of claim 17 , wherein the at least one redox agent is from about 0.5% to about 20% by weight of the composition.

21. The composition of claim 17 , wherein the polyaminopolycarboxylic acid is selected from the ground consisting of mono- or polyalkylene polyamine polycarboxylic acids, polyaminoalkane polycarboxylic acids, polyaminoalkanol polycarboxylic acids, and hydroxyalkylether polyamine polycarboxylic acids.

22. The composition of claim 21 , wherein the polyaminopolycarboxylic acid is diethylenetriamine pentaacetic acid.

23. The composition of claim 17 , wherein the polyaminopolycarboxylic acid is from about 0.01% to about 1% by weight of the composition.

24. The composition of claim 17 , wherein the at least one metal corrosion inhibitor comprises a benzotriazole optionally substituted by at least one substituent selected from the group consisting of alkyl groups, aryl groups, halogen groups, amino groups, nitro groups, alkoxy groups, and hydroxyl groups.

25. The composition of claim 24 , wherein the at least one metal corrosion inhibitor comprises 5-methylbenzotriazole.

26. The composition of claim 17 , wherein the at least one metal corrosion inhibitor is from about 0.05% to about 1% by weight of the composition.

27. The composition of claim 17 , wherein the at least one organic solvent comprises ethylene glycol butyl ether.

28. The composition of claim 17 , wherein the at least one organic solvent is from about 1% to about 30% by weight of the composition.

29. The composition of claim 17 , wherein 1,8-diazabicyclo[5.4.0]undec-7-ene is from about 0.1% to about 3% by weight of the composition.

30. The composition of claim 17 , wherein the composition comprises:
from about 3% to about 10% by weight of hydroxylamine;
from about 0.3% to about 0.7% by weight of diethylenetriamine pentaacetic acid;

from about 0.1% to about 0.5% by weight of 5-methylbenzotriazole;
from about 0.5% to about 1.5% by weight of 1,8-diazabicyclo[5.4.0]undec-7-ene;
from about 1% to about 15% by weight of ethylene glycol butyl ether; and
from about 85% to about 95% of the water.

31. A cleaning composition, comprising:
1) hydroxylamine;
2) an imine, wherein the imine is 1,8-diazabicyclo[5.4.0]undec-7-ene or 1,5-diazabicyclo[4.3.0]-5-nonene;
3) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; and
4) water.

32. The composition of claim 31 , wherein the pH of the composition is between about 6 and about 11.

33. The composition of claim 31 , wherein the hydroxylamine is from about 0.5% to about 20% by weight of the composition.

34. The composition of claim 31 , wherein the imine is 1,5-diazabicyclo[4.3.0]-5-nonene.

35. The composition of claim 31 , wherein the imine is 1,8-diazabicyclo[5.4.0]undec-7-ene.

36. A cleaning composition, comprising:
1) hydroxylamine;
2) an imine;
3) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; and
4) water;
wherein the imine is from about 0.1% to about 3% by weight of the composition.

37. The composition of claim 31 , wherein the at least one organic solvent comprises a water soluble alcohol.

38. The composition of claim 37 , wherein the water soluble alcohol is an alkane diol, a glycol, an alkoxyalcohol, a saturated aliphatic monohydric alcohol, an unsaturated non-aromatic monohydric alcohol, or an alcohol containing a

Assignees

• Fujifilm Electronic Mat Usa Inc

Inventors

• Takahashi Tomonori
• Du Bing
• Wojtczak William A
• Dory Thomas
• Kneer Emil A

Classifications

• H10P76/204

  of organic photoresist masks · CPC title

• H10P70/273

  the processing being a delineation of conductive layers, e.g. by RIE · CPC title

• H10P70/234

  the processing being the formation of vias or contact holes · CPC title

• H10P70/27

  during, before or after processing of conductive materials, e.g. polysilicon or amorphous silicon layers · CPC title

• H10P50/287

  by chemical means · CPC title