Production method for copper-clad laminate plate

US10244635B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10244635-B2
Application numberUS-201715570846-A
CountryUS
Kind codeB2
Filing dateJan 31, 2017
Priority dateMar 3, 2016
Publication dateMar 26, 2019
Grant dateMar 26, 2019

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

There is provided a method of producing a copper clad laminate having a copper foil and a resin bonded at high adhesive force despite the use of a thermoplastic resin having a low dielectric constant. This method includes the steps of: providing a roughened copper foil having at least one roughened surface having fine irregularities composed of acicular crystals containing cupric oxide and cuprous oxide; and bonding a sheet-shaped thermoplastic resin to the roughened surface of the roughened copper foil to provide a copper clad laminate. The roughened surface has a cupric oxide thickness of 1 to 20 nm and a cuprous oxide thickness of 15 to 70 nm, both determined by sequential electrochemical reduction analysis (SERA) at the time of bonding the thermoplastic resin.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of producing a copper clad laminate, comprising: providing a roughened copper foil having at least one roughened surface having irregularities composed of acicular crystals containing cupric oxide and cuprous oxide, and bonding a sheet-shaped thermoplastic resin to the roughened surface of the roughened copper foil to provide a copper clad laminate, wherein the roughened surface has a cupric oxide thickness of 1 to 20 nm and a cuprous oxide thickness of 15 to 70 nm, both determined by sequential electrochemical reduction analysis (SERA) at the time of bonding the thermoplastic resin. 2. The method according to claim 1 , wherein the acicular crystals have a height of 50 to 400 nm. 3. The method according to claim 1 , wherein the thermoplastic resin is at least one resin selected from the group consisting of polysulfones, polyethersulfones, amorphous polyarylates, liquid crystal polymers, polyether ether ketones, thermoplastic polyimides, polyamide-imides, fluororesins, polyamides, nylons, polyacetals, modified polyphenylene ethers, polyethylene terephthalate, glass fiber reinforced polyethylene terephthalate, and cycloolefins. 4. The method according to claim 1 , wherein the thermoplastic resin is at least one resin selected from the group consisting of polysulfones, polyethersulfones, amorphous polyarylates, liquid crystal polymers, polyether ether ketones, thermoplastic polyimides, polyamide-imides, and fluororesins. 5. The method according to claim 1 , wherein the thermoplastic resin is a fluororesin, and the fluororesin is at least one selected from the group consisting of polytetrafluoroethylene, tetrafluoroethylene-perfluoroalkylvinylether copolymers, tetrafluoroethylene-hexafluoropropylene copolymers, and tetrafluoroethylene-ethylene copolymers. 6. The method according to claim 1 , wherein the roughened copper foil has an organic rust-proof layer on the roughened surface. 7. The method according to claim 6 , wherein the organic rust-proof layer contains at least one of a triazole compound and a silane coupling agent. 8. The method according to claim 6 , wherein the organic rust-proof layer comprises a triazole compound.

Assignees

Inventors

Classifications

  • of metal · CPC title

  • Mechanical treatment, e.g. roughening, deforming, stretching · CPC title

  • Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites · CPC title

  • Dimensional properties · CPC title

  • H05K3/022Primary

    Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates · CPC title

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What does patent US10244635B2 cover?
There is provided a method of producing a copper clad laminate having a copper foil and a resin bonded at high adhesive force despite the use of a thermoplastic resin having a low dielectric constant. This method includes the steps of: providing a roughened copper foil having at least one roughened surface having fine irregularities composed of acicular crystals containing cupric oxide and cupr…
Who is the assignee on this patent?
Mitsui Mining & Smelting Co
What technology area does this patent fall under?
Primary CPC classification H05K3/022. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 26 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).