Wear amount measuring apparatus and method, temperature measuring apparatus and method and substrate processing system

Patent metadata

Field	Value
Publication number	US-10184786-B2
Application number	US-201414569990-A
Country	US
Kind code	B2
Filing date	Dec 15, 2014
Priority date	Dec 16, 2013
Publication date	Jan 22, 2019
Grant date	Jan 22, 2019

Abstract

A wear amount measuring apparatus includes a light source, a light transmission unit, a first and a second irradiation unit, a spectroscope and an analysis unit. The light transmission unit splits a low-coherence light from the light source into a first and a second low-coherence light. The first and the second irradiation units irradiate the first and the second low-coherence light to the component to receive reflected lights from the component. The light transmission unit transmits the reflected lights received by the first irradiation unit and the second irradiation unit to the spectroscope. The spectroscope configured to detect intensity distribution of the reflected lights from the first and the second irradiation unit. The analysis unit calculates a thickness difference between a thickness of the component at the first measuring point and that at the second measuring point by performing Fourier transform on the intensity distribution.

First claim

What is claimed is:

1. A wear amount measuring apparatus for measuring a wear amount of a component having a first surface and a second surface at least a part of which is worn over time, the component being made of a material which allows low-coherence light to pass therethrough, the apparatus comprising:
a light source configured to output a low-coherence light;
a light transmission unit configured to split the low-coherence light from the light source into a first low-coherence light and a second low-coherence light;
a first irradiation unit configured to irradiate the first low-coherence light received from the light transmission unit onto a first entrance point on the first surface to receive a reflected light from the first entrance point and a reflected light from a first measuring point on the second surface, the first measuring point being set at a part of the component which is not worn over time;
a second irradiation unit configured to irradiate the second low-coherence light received from the light transmission unit onto a second entrance point on the first surface to receive a reflected light from the second entrance point and a reflected light from a second measuring point on the second surface, the second measuring point being set at another part of the component other than the first measuring point and which is worn over time, wherein the light transmission unit receives the reflected lights from the first irradiation unit and the second irradiation unit to transmit them;
a spectroscope configured to detect intensity distribution of the reflected lights received from the transmission unit; and
an analysis unit configured to calculate a thickness difference between a first thickness of the component at the first measuring point and a second thickness of the component at the second measuring point by performing Fourier transform on the intensity distribution detected by the spectroscope,
wherein the thickness difference between the first thickness and the second thickness is measured based on a distance between two peaks among a plurality of peaks obtained by performing the Fourier transform, and
wherein the analysis unit is further configured to calculate an absolute value of a wear amount of the component at the second measuring point based on the thickness difference between the first thickness of the component at the first measuring point and the second thickness of the component at the second measuring point.

2. The wear amount measuring apparatus of claim 1 , wherein the analysis unit includes:
an optical path difference calculation unit configured to calculate an optical path difference between a first optical path extending from the first entrance point to the first measuring point and a second optical path extending from the second entrance point to the second measuring point by performing the Fourier transform on the intensity distribution detected by the spectroscope; and
a thickness difference calculation unit configured to calculate the thickness difference based on the optical path difference and a refractive index of the component.

3. The wear amount measuring apparatus of claim 1 , wherein the spectroscope includes:
a light dispersing device configured to disperse the reflected lights at predetermined dispersion angles based on wavelengths of the reflected lights; and
a light receiving device configured to receive the reflected lights dispersed by the light dispersing device and detect wavelength-dependent intensity distribution of the reflected lights.

4. A substrate processing system comprising:
the wear amount measuring apparatus of claim 1 configured to measure a wear amount of the component; and
a substrate processing apparatus including a chamber in which a mounting table for mounting thereon a substrate is provided, the chamber being configured to perform predetermined process on the substrate mounted on the mounting table, and the component disposed in the chamber.

5. The substrate processing system of claim 4 , wherein the substrate processing apparatus is an apparatus for performing plasma etching on the substrate mounted on the mounting table, and
wherein the component is an electrode plate disposed to face the substrate mounted on the mounting table with a predetermined gap therebetween.

Assignees

• Tokyo Electron Ltd

Inventors

• Matsudo Tatsuo

Classifications

• G01B11/0675 Primary

  using interferometry · CPC title

• H01J37/32449

  Gas control, e.g. control of the gas flow · CPC title

• G01B9/02044

  Imaging in the frequency domain, e.g. by using a spectrometer · CPC title

• H01J37/32642

  Focus rings · CPC title

• H01J37/32522

  Temperature · CPC title