On-axis illumination and alignment for charge control during charged particle beam inspection

Patent metadata

Field	Value
Publication number	US-10168614-B1
Application number	US-201715643271-A
Country	US
Kind code	B1
Filing date	Jul 6, 2017
Priority date	Jun 14, 2017
Publication date	Jan 1, 2019
Grant date	Jan 1, 2019

Abstract

A charged particle beam apparatus includes a charged particle source configured to generate charged particles, an electrode configured to accelerate the charged particles to form a charged particle beam, a bender unit configured to adjust a path of the charged particle beam, and an objective lens configured to focus the charged particle beam onto a spot on a sample. The charged particle beam passes through a bore of the objective lens as the charged particle beam propagates from the charged particle source to the sample. The apparatus also includes a light source configured to generate a light beam, and a mirror disposed within the bender unit and arranged to direct the light beam to the spot on the sample.

First claim

What is claimed is:

1. A charged particle beam apparatus, comprising:
a charged particle source configured to generate charged particles;
an electrode configured to accelerate the charged particles to form a charged particle beam;
a bender unit configured to adjust a path of the charged particle beam;
an objective lens configured to focus the charged particle beam onto a spot on a sample, the charged particle beam passing through a bore of the objective lens as the charged particle beam propagates from the charged particle source to the sample;
a light source configured to generate a light beam;
a mirror disposed within the bender unit and arranged to direct the light beam to the spot on the sample;
a sample support configured to support the sample, the sample support having a pinhole extending through a central region; and
a light sensor disposed on an opposite side of the sample support from the objective lens, the light sensor configured to sense light when the light beam is aligned with the pinhole.

2. The apparatus of claim 1 wherein a pointing direction of the light source is adjustable to align the light beam with the spot on the sample.

3. The apparatus of claim 1 wherein a position of the mirror is adjustable to align the light beam with the spot on the sample.

4. The apparatus of claim 1 wherein the path of the charged particle beam is adjustable to scan the charged particle beam on a surface of the sample, and the light source is adjustable to align the light beam with the charged particle beam on the surface of the sample during scanning.

5. The apparatus of claim 1 wherein an axis of the charged particle beam and an axis of the light beam are separated by an angle of less than 3° to provide substantially on-axis illumination of the spot.

6. The apparatus of claim 1 wherein the mirror is arranged to direct the light beam through the bore of the objective lens and to the spot on the sample.

7. The apparatus of claim 1 wherein the bender unit comprises an unobstructed path that does not block the light beam as the light beam passes through the bender unit.

8. The apparatus of claim 1 further comprising a detector configured to detect charged particles emitted or reflected from the sample.

9. The apparatus of claim 1 wherein a path of the light beam from the mirror to the spot on the sample is substantially normal to a surface of the sample.

10. A method of scanning a sample, the method comprising:
generating charged particles using a charged particle source;
accelerating the charged particles using an electrode to form a charged particle beam;
adjusting a path of the charged particle beam using a bender unit;
focusing the charged particle beam onto a spot on the sample using an objective lens, the charged particle beam passing through a bore of the objective lens as the charged particle beam propagates from the charged particle source to the sample;
generating a light beam using a light source;
directing the light beam through the bore of the objective lens using a mirror disposed within the bender unit, the light beam directed to the spot on the sample; and
adjusting a position of the mirror to align the light beam with the spot on the sample.

11. The method of claim 10 further comprising adjusting a pointing direction of the light source to align the light beam with the spot on the sample.

12. The method of claim 10 further comprising:
adjusting the path of the charged particle beam to scan the charged particle beam on a surface of the sample; and
adjusting an orientation of the light source to align the light beam with the charged particle beam on the surface of the sample during scanning.

13. A method of aligning a charged particle beam of a charged particle apparatus with a light beam, the method comprising:
generating charged particles using a charged particle source;
accelerating the charged particles using an electrode to form the charged particle beam;
adjusting a path of the charged particle beam using a bender unit;
focusing the charged particle beam onto a sample support using an objective lens, the charged particle beam passing through a bore of the objective lens as the charged particle beam propagates from the charged particle source to the sample support;
scanning the charged particle beam across a surface of the sample support;
detecting charged particles emitted or reflected from the sample support during scanning to identify a pinhole in the sample support;
adjusting the path of the charged particle beam to be substantially aligned with the pinhole;
generating the light beam using a light source;
directing the light beam toward the surface of the sample using a mirror disposed within the bender unit;
detecting the light beam using a light sensor when the light beam is aligned with the pinhole; and
adjusting a path of the light beam to be substantially aligned with the pinhole.

14. The method of claim 13 further comprising:
loading a sample onto the sample support;
scanning a surface of the sample with the charged particle beam; and
adjusting the path of the light beam to align the light beam with the charged particle beam on the surface of the sample during scanning.

15. The method of claim 13 wherein the path of the light beam is adjusted by changing a pointing direction of the light source.

16. The method of claim 13 wherein the path of the light beam is adjusted by changing a position of the mirror.

17. The method of claim 13 wherein the charged particle beam and the light beam are separated by an angle of less than 2° when both are aligned with the pinhole.

18. The method of claim 13 wherein the mirror is arranged to direct the light beam through the bore of the objective lens and to the surface of the sample.

Assignees

• Applied Materials Israel Ltd
• Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh

Inventors

• Goldenshtein Alex
• Lanio Stefan

Classifications

• G03F1/86 Primary

  by charged particle beam [CPB] · CPC title

• H01J37/228

  whereby illumination or light collection take place in the same area of the discharge · CPC title

• H01J2237/0047

  using electromagnetic radiations, e.g. UV, X-rays, light · CPC title

• H01J2237/063

  Electron sources · CPC title

• H01J37/026

  Means for avoiding or neutralising unwanted electrical charges on tube components · CPC title