Systems and methods for modifying acoustic waves based on selective heating

US10160061B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10160061-B2
Application numberUS-201615237408-A
CountryUS
Kind codeB2
Filing dateAug 15, 2016
Priority dateAug 15, 2016
Publication dateDec 25, 2018
Grant dateDec 25, 2018

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  1. Title

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  2. Abstract

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An acoustic wave is modified by initiating excitation of an acoustic wave from a first location on a substrate to a second location on the substrate and selectively heating the second location of the substrate so as to alter a property of the second location. With such arrangements, the altered property of the second location modifies the acoustic wave to result in a modified acoustic wave that is propagated from the second location to a third location on the substrate. Related apparatus, systems, and methods are also described.

First claim

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What is claimed: 1. A method for modifying an acoustic wave comprising: initiating excitation of an acoustic wave from a first location on a substrate to a second location on the substrate; and selectively heating, independently of the initiating excitation of the acoustic wave, the second location of the substrate so as to alter a property of the second location, the altered property of the second location modifying the acoustic wave to result in a modified acoustic wave that is propagated from the second location to a third location on the substrate. 2. The method of claim 1 , wherein the selectively heating is initiated subsequent or prior to the initiation of excitation of the acoustic wave but prior to the acoustic wave arriving at the second location on the substrate. 3. The method of claim 1 , further comprising: selectively heating the third location of the substrate so as to alter a property of the third location, the altered property of the third location further modifying the acoustic wave to result in a further modified acoustic wave that is propagated from the third location to a fourth location on the substrate. 4. The method of claim 1 , wherein the acoustic wave includes a surface acoustic wave. 5. The method of claim 1 , wherein the acoustic wave includes a bulk acoustic wave. 6. The method of claim 1 , wherein the altered property of the second location is selected from the group consisting of a thermal property, a mechanical property, and a chemical property. 7. The method of claim 1 , wherein the altered property of the second location focuses or defocuses the acoustic wave at the third location. 8. The method of claim 1 , wherein the altered property of the second location redirects a path of the acoustic wave toward the third location. 9. The method of claim 1 , wherein the altered property of the second location shifts a phase of the acoustic wave. 10. The method of claim 1 , wherein the first location of the substrate includes a first set of interdigitated electrodes configured to initiate excitation of the acoustic wave responsive to a first voltage applied across the first set of interdigitated electrodes. 11. The method of claim 10 , wherein the third location of the substrate includes a second set of interdigitated electrodes configured to generate a second voltage across the second set of interdigitated electrodes responsive to receipt of the modified acoustic wave. 12. The method of claim 1 , wherein the selectively heating the second location of the substrate comprises selectively irradiating the second location with a short or long pulsed laser or a continuous laser. 13. The method of claim 1 , wherein the selectively heating the second location of the substrate comprises selectively irradiating the second location with an electron beam. 14. The method of claim 1 , wherein the selectively heating the second location of the substrate comprises actuating a resistive heater in contact with the second location of the substrate. 15. The method of claim 1 , wherein the selectively heating the second location of the substrate comprises initiating a chemical reaction that produces heat at the second location of the substrate. 16. The method of claim 1 , further comprising sensing the modified acoustic wave at the third location. 17. The method of claim 16 , wherein the sensing comprises irradiating the third location with a laser beam. 18. The method of claim 1 , wherein the first location is disposed at a first material of the substrate, the second location is disposed at a second material of the substrate, and the third location is disposed at a third material of the substrate, wherein the second material includes a different material than does the first material and the third material. 19. The method of claim 1 , wherein at least one of the first location, the second location, and the third location is embedded within the substrate. 20. The method of claim 1 , wherein the acoustic wave is either a single wavelength wave or a wave packet. 21. A system for modifying an acoustic wave comprising: a heater thermally coupled to a substrate, the substrate having a first location and a second location; and a controller coupled to the heater, the controller configured so as to: initiate excitation of an acoustic wave from the first location on to the second location; and selectively heat, independently of the initiated excitation of the acoustic wave, the second location of the substrate so as to alter a property of the second location, the altered property of the second location modifying the acoustic wave to result in a modified acoustic wave that is propagated from the second location to a third location on the substrate. 22. The system of claim 21 , wherein the selectively heating is initiated subsequent or prior to the initiation of excitation of the acoustic wave but prior to the acoustic wave arrival at the second location on the substrate. 23. The system of claim 21 , wherein the controller is further configured to: selectively heat the third location of the substrate so as to alter a property of the third location, the altered property of the third location further modifying the acoustic wave to result in a further modified acoustic wave that is propagated from the third location to a fourth location on the substrate. 24. The system of claim 21 , wherein the acoustic wave includes a surface acoustic wave. 25. The system of claim 21 , wherein the acoustic wave includes a bulk acoustic wave. 26. The system of claim 21 , wherein the altered property is selected from the group consisting of a thermal property, a mechanical property, and a chemical property. 27. The system of claim 21 , wherein the altered property of the second location focuses or defocuses the acoustic wave at the third location. 28. The system of claim 21 , wherein the altered property of the second location redirects a path of the acoustic wave toward the third location. 29. The system of claim 21 , wherein the altered property of the second location shifts a phase of the acoustic wave. 30. The system of claim 21 , wherein the first location of the substrate includes a first set of interdigitated electrodes configured to initiate the acoustic wave responsive to a first voltage applied across the first set of interdigitated electrodes. 31. The system of claim 30 , wherein the third location of the substrate includes a second set of interdigitated electrodes configured to generate a second voltage across the second set of interdigitated electrodes responsive to receipt of the modified acoustic wave. 32. The system of claim 21 , wherein the heater comprises a short or a long pulsed laser or a continuous laser. 33. The system of claim 21 , wherein the heater comprises an electron beam source. 34. The system of claim 21 , wherein the heater comprises a resistive heater in contact with the second location of the substrate. 35. The system of claim 21 , wherein the heater comprises means for initiating a chemical reaction that produces heat at the second location of the substrate. 36. The system of claim 21 , wherein the first location is disposed at a first material of the substrate, the second location is di

Assignees

Inventors

Classifications

  • Apparatus or devices using heat produced by exothermal chemical reactions other than combustion · CPC title

  • Working by transmitting the laser beam through or within the workpiece · CPC title

  • Devices for manipulating acoustic surface waves (electro-acoustic amplifiers H03F13/00; networks comprising electro-acoustic elements H03H9/00) · CPC title

  • Heater elements structurally combined with coupling elements or holders · CPC title

  • specially adapted for particular articles or work · CPC title

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What does patent US10160061B2 cover?
An acoustic wave is modified by initiating excitation of an acoustic wave from a first location on a substrate to a second location on the substrate and selectively heating the second location of the substrate so as to alter a property of the second location. With such arrangements, the altered property of the second location modifies the acoustic wave to result in a modified acoustic wave that…
Who is the assignee on this patent?
Aerospace Corp
What technology area does this patent fall under?
Primary CPC classification B23K26/351. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Dec 25 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).