Processing gas generating apparatus, processing gas generating method, substrate processing method, and storage medium

Patent metadata

Field	Value
Publication number	US-10141209-B2
Application number	US-201514630806-A
Country	US
Kind code	B2
Filing date	Feb 25, 2015
Priority date	Feb 28, 2014
Publication date	Nov 27, 2018
Grant date	Nov 27, 2018

Abstract

The present disclosure provides an apparatus for generating a processing gas by bubbling a raw material liquid with a carrier gas. The processing gas generated by the bubbling is taken out from a vapor-phase portion above a liquid-phase portion of the raw material liquid through a taking-out unit. A first temperature adjusting unit performs a temperature adjustment of the liquid-phase portion and a second temperature adjusting unit performs a temperature adjustment of the vapor-phase portion such that the temperature of the vapor-phase portion is higher than the temperature of the liquid-phase portion.

First claim

What is claimed is:

1. An apparatus for generating a processing gas by bubbling a raw material liquid with a carrier gas, the apparatus comprising:
a raw material liquid tank configured to store the raw material liquid;
a raw material liquid supplying path provided between a raw material liquid bottle that stores the raw material liquid and the raw material liquid tank and configured to supply the raw material liquid into the raw material liquid tank from the raw material liquid bottle,
a cover provided at a top portion of the raw material liquid tank and configured to block an opening formed on a top surface of the raw material liquid tank;
a carrier gas source connected to the raw material liquid tank through a carrier gas supply path and configured to supply the carrier gas to the raw material liquid in the raw material liquid tank;
a taking-out path provided inside the cover and configured to take out the processing gas generated by the bubbling from a vapor-phase portion above a liquid-phase portion which is a region where the raw material liquid is stored in the raw material liquid tank, an end of the taking-out path being connected to the vapor-phase portion and the other end of the taking-out path being connected to a processing gas supply path to supply the processing gas to a substrate provided outside of the apparatus for generating the processing gas through the processing gas supply path;
a first temperature controller having a square column shape to cover a side wall and a bottom wall of the raw material liquid tank and configured to perform a temperature adjustment of the liquid-phase portion through at least one of the side wall and the bottom wall of the raw material liquid tank; and
a second temperature controller having a plate shape to cover an upper surface of the cover and configured to perform a temperature adjustment of the vapor-phase portion through the upper surface of the cover such that a temperature of the vapor-phase portion is higher than a temperature of the liquid-phase portion,
wherein the raw material liquid supplying path includes a raw material liquid temperature controller provided from an outside of a sidewall surface of the first temperature controller to an inside of the raw material liquid tank and configured to adjust a temperature of the raw material liquid such that the temperature of the raw material liquid supplied to the raw material liquid tank approaches the temperature of the liquid-phase portion.

2. The apparatus of claim 1 , wherein the raw material liquid temperature controller includes a preliminary temperature controller provided on the sidewall surface of the first temperature controller and provided with a spiral pipe formed by winding a portion of the raw material liquid supplying path in a spiral shape such that an outer peripheral surface and an inner peripheral surface of the spiral pipe arranged an inside and an outside in a radial direction are in contact with each other to transfer heat through the outer peripheral surface and the inner peripheral surface of the spiral pipe, and
the preliminary temperature controller is configured to cause the temperature of the raw material liquid to approach the temperature of the liquid-phase portion at an outside of the raw material liquid tank.

3. The apparatus of claim 2 , wherein the raw material liquid supplying path includes a supply pipe through which the raw material liquid is supplied to the raw material tank, and
the preliminary temperature controller is configured to cause the temperature of the raw material liquid flowing through the supply pipe to approach the temperature of the liquid-phase portion, using the first temperature controller.

4. The apparatus of claim 2 , wherein the raw material liquid supplying path includes a supply pipe through which the raw material liquid is supplied to the raw material liquid tank from the raw material liquid bottle, and
the raw material liquid temperature controller further includes a heat exchanging unit provided inside of the raw material liquid tank and constituted by a terminal end side of the supply pipe disposed to be immersed in the raw material liquid of the liquid-phase portion, and configured to perform a heat exchange between the raw material liquid in the supply pipe and the liquid-phase portion such that the temperature of the raw material liquid supplied to the raw material liquid tank approaches the temperature of the liquid-phase portion.

5. The apparatus of claim 4 , wherein the terminal end side of the supply pipe constituting the heat exchanging unit is formed in a spiral shape extending vertically in the raw material liquid tank.

6. The apparatus of claim 4 , wherein the terminal end side of the supply pipe constituting the heat exchanging unit is made of a resin.

7. The apparatus of claim 1 , further comprising:
a liquid-phase temperature detector inserted into the cover toward an inside of the raw material liquid tank through the opening of the raw material liquid tank and configured to detect the temperature of the liquid-phase portion; and
a vapor-phase temperature detector inserted into the cover toward the inside of the raw material liquid tank through the opening of the raw material liquid tank and configured to detect the temperature of the vapor-phase portion,
wherein the first temperature controller is configured to perform the temperature adjustment of the liquid-phase portion such that a detection temperature of the liquid-phase temperature detector becomes a first temperature serving as a temperature set value of the liquid-phase portion, and
the second temperature controller is configured to perform the temperature adjustment of the vapor-phase portion such that a detection temperature of the vapor-phase temperature detector becomes a second temperature serving as a temperature set value of the vapor-phase portion.

8. The apparatus of claim 1 , further comprising:
a liquid level meter configured to detect a height position of a liquid level of the liquid-phase portion,
wherein, when the height position of the liquid level detected by the liquid level meter reaches a preset lower limit, the raw material liquid supplying path is configured to supply the raw material liquid to the raw material liquid tank.

9. An apparatus for generating a processing gas by bubbling a raw material liquid with a carrier gas, the apparatus comprising:
a raw material liquid tank configured to store the raw material liquid;
a cover provided at a top portion of the raw material liquid tank and configured to block an opening formed on a top surface of the raw material liquid tank;
a carrier gas source connected to the raw material liquid tank through a carrier gas supply path and configured to supply the carrier gas to the raw material liquid in the raw material liquid tank;
a taking-out path provided inside the cover and configured to take out a processing gas generated by the bubbling from a vapor-phase portion above a liquid-phase portion which is a region where the raw material liquid is stored in the raw material liquid tank, an end of the taking-out path being connected to the vapor-phase portion and the other end of the taking-out path being connected to a processing gas supply path to supply the processing gas to a substrate provided outside of the apparatus for generating the processing gas through the processing gas supply path;
a raw material liquid supplying path including a supply pipe through which the raw material liquid is supplied to the raw material liquid tank from a raw material liquid bottle that stores the raw material liquid and provided between the raw material liquid bottle and the raw material liquid tank;
a first temperature controller

Assignees

• Tokyo Electron Ltd

Inventors

• Itonaga Masashi
• Watanabe Masanobu

Classifications

• H10P90/12

  Preparing bulk and homogeneous wafers · CPC title

• H10P14/20

  of semiconductor materials · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/0602 Primary

  Temperature monitoring · CPC title

• H01L21/67248 Primary

  Electricity · mapped topic