Support cylinder for thermal processing chamber

Patent metadata

Field	Value
Publication number	US-10128144-B2
Application number	US-201715600336-A
Country	US
Kind code	B2
Filing date	May 19, 2017
Priority date	Aug 15, 2013
Publication date	Nov 13, 2018
Grant date	Nov 13, 2018

Abstract

Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder includes a hollow cylindrical body comprising an inner peripheral surface, an outer peripheral surface parallel to the inner peripheral surface, wherein the inner peripheral surface and the outer peripheral surface extend along a direction parallel to a longitudinal axis of the support cylinder, and a lateral portion extending radially from the outer peripheral surface to the inner peripheral surface, wherein the lateral portion comprises a first end having a first beveled portion, a first rounded portion, and a first planar portion connecting the first beveled portion and the first rounded portion, and a second end opposing the first end, the second end having a second beveled portion, a second rounded portion, and a second planar portion connecting the second beveled portion and the second rounded portion.

First claim

The invention claimed is:

1. A support cylinder for a processing chamber, comprising:
a body having an inner peripheral surface, an outer peripheral surface surrounding the inner peripheral surface, and a lateral portion extending radially from the outer peripheral surface to the inner peripheral surface, wherein the lateral portion comprises:
a first end having a first portion, a second portion, and a first planar portion between the first portion and the second portion, wherein the first portion of the first end is sloped toward the inner peripheral surface at an angle of about 15° to about 40° with respect to the inner peripheral surface, and the second portion of the first end has a radius of about 0.25 mm to about 0.5 mm; and
a second end opposing the first end, the second end having a first portion, a second portion, and a second planar portion between the first portion of the second end and the second portion of the second end.

2. The support cylinder of claim 1 , wherein the first portion of the second end is sloped toward the outer peripheral surface at an angle of about 15° to about 40° with respect to the outer peripheral surface.

3. The support cylinder of claim 1 , wherein the body is a hollow cylindrical body.

4. The support cylinder of claim 1 , wherein the body is made of opaque quartz glass material.

5. The support cylinder of claim 1 , wherein the first planar portion has a bump or a projection.

6. The support cylinder of claim 5 , wherein the projection has a shape of rectangular, rhombus, square, hemispherical, hexagonal, or triangular.

7. The support cylinder of claim 1 , wherein the body comprises silica.

8. The support cylinder of claim 1 , wherein the body is a quartz glass having a coating of silica.

9. The support cylinder of claim 1 , wherein the body is formed from a clear quartz, a silicon carbide, or a silicon-impregnated silicon carbide.

10. The support cylinder of claim 1 , wherein the body is coated with a clear fused quartz.

11. The support cylinder of claim 10 , wherein the clear fused quartz is formed on the inner peripheral surface, and the clear fused quartz is covered by a reflective coating layer.

12. The support cylinder of claim 11 , wherein the reflective coating layer is a fused silica or a borosilicate glass.

13. The support cylinder of claim 10 , wherein the clear fused quartz is formed on the inner peripheral surface, and the clear fused quartz is covered by a heat absorptive coating layer.

14. The support cylinder of claim 1 , wherein the first portion of the first end is beveled, the second portion of the first end is rounded, the first portion of the second end is beveled, and the second portion of the second end is rounded.

15. A support cylinder for a processing chamber, comprising:
a hollow cylindrical body made of an opaque quartz, the hollow cylindrical body comprising:
an inner peripheral surface;
an outer peripheral surface surrounding the inner peripheral surface; and
a lateral portion extending radially from the outer peripheral surface to the inner peripheral surface, wherein the lateral portion comprising:
a first end having a first portion, a second portion, and a planar portion between the first portion and the second portion, wherein the first portion of the first end is sloped toward the inner peripheral surface at a first angle with respect to the inner peripheral surface, and the second portion of the first end has a first radius; and
a second end opposing the first end, the second end having a first portion, a second portion, and a planar portion between the first portion of the second end and the second portion of the second end, wherein the first portion of the second end is sloped toward the outer peripheral surface at a second angle with respect to the outer peripheral surface.

16. The support cylinder of claim 15 , wherein the first angle is about 15° to about 40°.

17. The support cylinder of claim 15 , wherein the second angle is about 15° to about 40°.

18. The support cylinder of claim 15 , wherein the first portion of the first end is beveled, the second portion of the first end is rounded, the first portion of the second end is beveled, and the second portion of the second end is rounded.

19. The support cylinder of claim 18 , wherein the second portion of the first end has a radius of about 0.25 mm to about 0.5 mm.

20. The support cylinder of claim 15 , wherein the planar portion of the first end has a width of about 0.5 mm.

Assignees

• Applied Materials Inc

Inventors

• Behdjat Mehran
• Hunter Aaron Muir
• Ranish Joseph M
• Tam Norman
• Tobin Jeffrey
• Li Jiping
• Tran Martin

Classifications

• H10P95/90 Primary

  Thermal treatments, e.g. annealing or sintering · CPC title

• H10P72/7616

  characterised by a coating, a hardness or a material · CPC title

• H10P72/0436 Primary

  mainly by radiation · CPC title

• H10P72/7611 Primary

  characterised by edge profile or support profile · CPC title

• H01L21/68735 Primary

  Electricity · mapped topic