Support cylinder for thermal processing chamber

US9659809B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9659809-B2
Application numberUS-201615188706-A
CountryUS
Kind codeB2
Filing dateJun 21, 2016
Priority dateAug 15, 2013
Publication dateMay 23, 2017
Grant dateMay 23, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder includes a hollow cylindrical body comprising an inner peripheral surface, an outer peripheral surface parallel to the inner peripheral surface, wherein the inner peripheral surface and the outer peripheral surface extend along a direction parallel to a longitudinal axis of the support cylinder, and a lateral portion extending radially from the outer peripheral surface to the inner peripheral surface, wherein the lateral portion comprises a first end having a first beveled portion, a first rounded portion, and a first planar portion connecting the first beveled portion and the first rounded portion, and a second end opposing the first end, the second end having a second beveled portion, a second rounded portion, and a second planar portion connecting the second beveled portion and the second rounded portion.

First claim

Opening claim text (preview).

The invention claimed is: 1. A support cylinder for a processing chamber, comprising: a hollow cylindrical body comprising: an inner peripheral surface; an outer peripheral surface parallel to the inner peripheral surface, wherein the inner peripheral surface and the outer peripheral surface extend along a direction parallel to a longitudinal axis of the support cylinder; and a lateral portion extending radially from the outer peripheral surface to the inner peripheral surface, wherein the lateral portion comprises: a first end having a first portion, a second portion, and a first planar portion between the first portion and the second portion; and a second end opposing the first end, the second end having a first portion, a second portion, and a second planar portion between the first portion of the second end and the second portion of the second end. 2. The support cylinder of claim 1 , wherein the second portion of the first end has a radius of about 0.25 mm to about 0.5 mm. 3. The support cylinder of claim 1 , wherein the first portion of the first end is sloped toward the inner peripheral surface at an angle with respect to the inner peripheral surface. 4. The support cylinder of claim 3 , wherein the angle is about 15° to about 40°. 5. The support cylinder of claim 1 , wherein the first portion of the second end is sloped toward the outer peripheral surface at an angle with respect to the outer peripheral surface. 6. The support cylinder of claim 5 , wherein the angle is about 15° to about 40°. 7. The support cylinder of claim 1 , wherein the first planar portion has a bump or a projection. 8. The support cylinder of claim 7 , wherein the projection has a shape of rectangular, rhombus, square, hemispherical, hexagonal, or triangular. 9. The support cylinder of claim 1 , wherein the hollow cylindrical body is made of opaque quartz glass material. 10. The support cylinder of claim 1 , wherein the hollow cylindrical body comprises silica. 11. The support cylinder of claim 1 , wherein the hollow cylindrical body is a quartz glass having a coating of silica. 12. The support cylinder of claim 1 , wherein the hollow cylindrical body is formed from a clear quartz, a silicon carbide, or a silicon-impregnated silicon carbide. 13. The support cylinder of claim 1 , wherein the hollow cylindrical body is coated with an optical transparent layer. 14. The support cylinder of claim 13 , wherein the optical transparent layer is a clear fused quartz. 15. The support cylinder of claim 13 , wherein the optical transparent layer covers exposed surfaces of the hollow cylindrical body except the first portion of the second end, the second portion of the second end, and the second planar portion. 16. The support cylinder of claim 13 , wherein the optical transparent layer formed on the inner peripheral surface is covered by a reflective coating layer. 17. The support cylinder of claim 16 , wherein the reflective coating layer is a fused silica, borosilicate glass. 18. The support cylinder of claim 13 , wherein the optical transparent layer formed on the inner peripheral surface is covered by a heat absorptive coating layer absorbing thermal radiation at a wavelength of 1 micron to 4 micron. 19. The support cylinder of claim 18 , wherein the heat absorptive coating layer made of polyurethane material, carbon black paint or a composition including graphite. 20. The support cylinder of claim 1 , wherein the first portion of the first end is beveled, the second portion of the first end is rounded, the first portion of the second end is beveled, and the second portion of the second end is rounded.

Assignees

Inventors

Classifications

  • H10P95/90Primary

    Thermal treatments, e.g. annealing or sintering · CPC title

  • characterised by a coating, a hardness or a material · CPC title

  • mainly by radiation · CPC title

  • characterised by edge profile or support profile · CPC title

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US9659809B2 cover?
Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder includes a hollow cylindrical body comprising an inner peripheral surface, an outer peripheral surface parallel to the inner peripheral surface, wherein the inner peripheral surface and the outer peripheral surface extend along a direction parallel to a…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10P95/90. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 23 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).