Crystal material, method for manufacturing crystal, radiation detector, nondestructive inspection apparatus, and imaging apparatus

US10011770B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10011770-B2
Application numberUS-201615566199-A
CountryUS
Kind codeB2
Filing dateMay 27, 2016
Priority dateMay 27, 2015
Publication dateJul 3, 2018
Grant dateJul 3, 2018

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  1. Title

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A crystal material that is represented by a general formula (1): (RE x A 1-x-y-s B y M′ s ) 2+α (Si 1-t ,M″ t ) 2+β O 7+γ (1), the crystal material having a pyrochlore type structure, being a nonstoichiometric composition, and being a congruent melting composition, wherein in Formula (1), A contains at least one or more selected from Gd, Y, La, Sc, Yb, and Lu; B contains at least one or more selected from La, Gd, Yb, Lu, Y, and Sc; 0.1≤y<0.4; RE contains at least one or more selected from Ce, Pr, Nd, Eu, Tb, and Yb; 0<x<0.1; M′ and M″ contain at least one or more selected from Li, Na, K, Mg, Ca, Sr, Ba, Ti, Zr, Hf, Fe, Ta, and W; 0≤s<0.01 and 0≤t<0.01; and 0<|α|<0.3 and 0≤|β|<0.3 and 0≤|γ|<0.5.

First claim

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The invention claimed is: 1. A crystal material that is represented by a general formula (1): (RE x A 1-x-y-s B y M′ s ) 2+α (Si 1-t ,M″ t ) 2+β O 7+γ   (1), the crystal material having a pyrochlore type structure, being a nonstoichiometric composition, and being a congruent melting composition, wherein in Formula (1), A contains at least one or more selected from Gd, Y, La, Sc, Yb, and Lu; B contains at least one or more selected from La, Gd, Yb, Lu, Y, and Sc; 0.1≤y<0.4; RE contains at least one or more selected from Ce, Pr, Nd, Eu, Tb, and Yb; 0<x<0.1; M′ and M″ contain at least one or more selected from Li, Na, K, Mg, Ca, Sr, Ba, Ti, Zr, Hf, Fe, Ta, and W; 0≤s<0.01 and 0≤t<0.01; and 0<|α|<0.3 and 0≤|β|<0.3 and 0≤|γ|<0.5. 2. The crystal material according to claim 1 , wherein ranges of x, y, s, t, α, β, and γ are further represented by 0<x<0.05, 0.1<y<0.40, 0≤s<0.005, and 0≤t<0.005, 0.001<|α|<0.15 and 0.001≤|β|<0.15 and 0.001<|γ|<0.2. 3. The crystal material according to claim 1 , wherein ranges of x, y, s, t, α, β, and γ are further represented by 0<x<0.04, 0.1<y<0.35, 0≤s<0.005, and 0≤t<0.005, 0.01<|α|<0.1 and 0.01≤|β|<0.1 and 0.001≤|γ|<0.2. 4. The crystal material according to claim 1 , wherein in the general formula (1), RE is Ce; A is Gd; and B is one or more selected from La and Y. 5. The crystal material according to claim 1 , wherein the crystal material emits scintillation light through irradiation with radiation, with a certain fluorescent component contained in the scintillation light having a fluorescence lifetime of 2 μs or less and a peak fluorescence wavelength within a range of 250 nm or more and 900 nm or less. 6. The crystal material according to claim 1 , wherein the crystal material emits scintillation light through irradiation with radiation, with a certain fluorescent component contained in the scintillation light having a fluorescence lifetime of 80 ns or less and a peak fluorescence wavelength within a range of 300 nm or more and 700 nm or less. 7. The crystal material according to claim 1 , wherein the crystal material emits scintillation light through irradiation with radiation, with a light emission amount of a certain fluorescent component contained in the scintillation light exceeding 13,000 photons/MeV in an environmental temperature range from room temperature to 150° C. and the crystal material does not have deliquescence. 8. A method for manufacturing a crystal, the method comprising blending raw materials containing A, Si, and RE so as to provide an element ratio of the crystal material according to claim 1 , increasing a temperature of the blended raw materials until the blended raw materials melt and then cooling the raw materials, and providing a crystal having a pyrochlore type structure and a crystallization rate of 50% or more. 9. A radiation detector comprising: a scintillator formed of the crystal material according to claim 1 ; and a photodetector that receives scintillation light from the scintillator. 10. An imaging apparatus comprising the radiation detector according to claim 9 . 11. A nondestructive inspection apparatus comprising the radiation detector according to claim 9 . 12. A radiation detector comprising: a scintillator formed of the crystal material according to claim 1 ; a wavelength conversion element that receives scintillation light from the scintillator and converts a wavelength of light with wavelengths from 260 nm to 350 nm contained in the scintillation light into any wavelength in a range from 320 nm to 700 nm; and a photodetector that receives light wavelength-converted by the wavelength conversion element. 13. An imaging apparatus comprising the radiation detector according to claim 12 . 14. A nondestructive inspection apparatus comprising the radiation detector according to claim 12 . 15. A radiation detector comprising the scintillator formed of the crystal material according to claim 1 having positional sensitivity. 16. An imaging apparatus comprising the radiation detector according to claim 15 . 17. A nondestructive inspection apparatus comprising the radiation detector according to claim 15 .

Assignees

Inventors

Classifications

  • Applications in the field of nuclear medicine, e.g. in vivo counting {(apparatus for radiation diagnosis A61B6/00)} · CPC title

  • Selection of materials · CPC title

  • using a combination of a scintillator and photodetector which measures the means radiation intensity · CPC title

  • with scintillation detectors · CPC title

  • Complex oxides · CPC title

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What does patent US10011770B2 cover?
A crystal material that is represented by a general formula (1): (RE x A 1-x-y-s B y M′ s ) 2+α (Si 1-t ,M″ t ) 2+β O 7+γ (1), the crystal material having a pyrochlore type structure, being a nonstoichiometric composition, and being a congruent melting composition, wherein in Formula (1), A contains at least one or more selected from Gd, Y, La, Sc, Yb, and Lu; B contains at least one or more s…
Who is the assignee on this patent?
Univ Tohoku, C&A Corp
What technology area does this patent fall under?
Primary CPC classification C09K11/7774. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 03 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).