Lithographic apparatus, drying device, metrology apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-10018925-B2
Application number	US-201715452445-A
Country	US
Kind code	B2
Filing date	Mar 7, 2017
Priority date	Aug 19, 2008
Publication date	Jul 10, 2018
Grant date	Jul 10, 2018

Abstract

An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

First claim

The invention claimed is:

1. A lithographic apparatus comprising:
a projection system configured to project a radiation beam onto a radiation-sensitive substrate;
a movable table; and
a fluid handling structure configured to remove a fluid comprising a combination of liquid and gas, the fluid handling structure comprising a barrier member arranged to at least partly confine a liquid to a space between the movable table and the projection system, the barrier member comprising:
an opening to remove the fluid,
a porous member internal to the barrier member and facing toward the table, the porous member located downstream of, and apart from, the opening and the porous member configured to receive a part of the removed fluid separate from a remainder of the removed fluid within the barrier member, and
a conduit to discharge the remainder of the removed fluid.

2. The lithographic apparatus of claim 1 , wherein the porous member is part of a duct to discharge the part of the removed fluid and the porous member is essentially liquid impermeable.

3. The lithographic apparatus of claim 1 , wherein the porous member is part of a duct to discharge the part of the removed fluid and the porous member is essentially gas impermeable.

4. The lithographic apparatus of claim 1 , further comprising a chamber within the barrier member, the interior of the chamber having an opening of the conduit and an opening of a duct to discharge the part of the removed fluid.

5. The lithographic apparatus of claim 4 , wherein the opening of the duct is lower than the opening of the conduit.

6. The lithographic apparatus of claim 4 , wherein at least part of the duct protrudes into the chamber.

7. The lithographic apparatus of claim 4 , further comprising a liquid-phobic surface in the interior of the chamber.

8. The lithographic apparatus of claim 4 , wherein the opening of the duct and the opening of the conduit are in, or attached to, an upper wall of the chamber.

9. The lithographic apparatus of claim 4 , further comprising a plurality of horizontal flow directing structures in the chamber.

10. A lithographic apparatus comprising:
a projection system configured to project a radiation beam onto a radiation-sensitive substrate;
a movable table; and
a fluid handling structure arranged to remove a fluid comprising a combination of liquid and gas, the fluid handling structure comprising a barrier member arranged to at least partly confine a liquid to a space between the movable table and the projection system, the barrier member comprising:
an opening to remove the fluid,
a chamber, internal to the barrier member, arranged to receive the removed fluid, the chamber having a generally horizontal wall in the interior of the chamber,
a gas discharge opening in the chamber, the gas discharge opening configured to discharge primarily gas, and
a separate liquid discharge opening in the chamber, the liquid discharge opening configured to discharge primarily liquid.

11. The lithographic apparatus of claim 10 , wherein the liquid discharge opening is located at a distal end of at least part of a discharge channel protruding into the chamber.

12. The lithographic apparatus of claim 10 , wherein the liquid discharge opening comprises a porous member.

13. The lithographic apparatus of claim 10 , wherein the gas discharge opening and the liquid discharge opening are in, or attached to, the generally horizontal wall of the chamber.

14. The lithographic apparatus of claim 10 , wherein the liquid discharge opening is lower than the gas discharge opening.

15. The lithographic apparatus of claim 10 , wherein the interior of the chamber has a length in the horizontal larger than a width in the vertical.

16. The lithographic apparatus of claim 10 , further comprising a liquid-phobic surface in the interior of the chamber.

17. A lithographic apparatus comprising:
a projection system configured to project a radiation beam onto a radiation-sensitive substrate;
a movable table; and
a fluid handling structure arranged to remove a fluid comprising a combination of liquid and gas, the fluid handling structure comprising a barrier member arranged to at least partly confine a liquid to a space between the movable table and the projection system, the barrier member comprising:
an opening to remove the fluid,
a chamber, internal to the barrier member, arranged to receive the removed fluid,
a first discharge opening in the chamber, and
at least part of a discharge channel protruding into the chamber and having a second discharge opening at a distal end thereof, the discharge channel comprising a porous member.

18. The lithographic apparatus of claim 17 , wherein the first discharge opening is configured to discharge primarily gas and the second discharge opening is configured to discharge primarily liquid.

19. The lithographic apparatus of claim 17 , wherein the at least part of the discharge channel protrudes down from an upper wall of the chamber.

20. The lithographic apparatus of claim 19 , wherein the first discharge opening is located at the upper wall.

21. A lithographic apparatus comprising:
a projection system configured to project a radiation beam onto a radiation-sensitive substrate;
a movable table; and
a fluid handling structure arranged to remove a fluid comprising a combination of liquid and gas, the fluid handling structure comprising:
a barrier member arranged to at least partly confine a liquid to a space between the movable table and the projection system, the barrier member comprising an opening through which the fluid is removed, and
a discharge conduit arranged to receive the removed fluid, the discharge conduit comprising a porous member on opposite sides of a flow path of the removed fluid through the discharge conduit, wherein primarily liquid from the removed fluid passes through the porous member and primarily gas continues to flow along the flow path.

Assignees

• Asml Netherlands Bv

Inventors

• Kemper Nicolaas Rudolf
• Ten Kate Nicolaas
• Ottens Joost Jeroen
• Beckers Marcel
• Polizzi Marco
• Riepen Michel
• Kuijper Anthonie
• Steffens Koen
• Baeten Adrianes Johannes
• Antonevici Anca Mihaela

Classifications

• G03F7/70866 Primary

  of mask or workpiece · CPC title

• G03F7/70341

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title

• B01D19/0021

  by bringing the liquid in a thin layer · CPC title

• G03B27/52 Primary

  Details · CPC title