Method for producing a tribologically distressed laminate, a laminate and use of an organometallic compound for producing a functional layer of the laminate

Patent metadata

Field	Value
Publication number	US-10000846-B2
Application number	US-201314410550-A
Country	US
Kind code	B2
Filing date	May 23, 2013
Priority date	Jun 26, 2012
Publication date	Jun 19, 2018
Grant date	Jun 19, 2018

Abstract

A method for producing a laminate that has to undergo frictional loads, including a substrate and a functional layer formed from tungsten-containing, amorphous diamond-like carbon. To be able to produce such functional layers easily, they are applied by means of a tungsten-containing precursor and by using a PACVD process. A laminate including a functional layer produced by means of a precursor and to the use of a metallo-organic compound as a precursor for producing a functional layer.

First claim

The invention claimed is:

1. A method for producing a tribologically stressed laminate, comprising:
applying a functional layer to a substrate, the functional layer made of tungsten-containing, amorphous, diamond-like carbon,
wherein the functional layer is applied using a PACVD method and a tungsten-containing precursor.

2. The method as recited in claim 1 wherein the precursor is liquid or dissolved in liquid.

3. The method as recited in claim 2 wherein the precursor is made of an organometallic substance.

4. The method as recited in claim 3 wherein the organometallic substance includes a central atom of tungsten, at least one ligand of carbon monoxide and at least one ligand of an organic compound.

5. The method as recited in claim 4 wherein the organic compound is an at least diunsaturated hydrocarbon.

6. The method as recited in claim 3 wherein the precursor is a [(CO) 2 (diene) 2 W] compound.

7. The method as recited in claim 2 wherein the precursor is applied to the substrate with the aid of vapor pressure.

8. A laminate comprising:
a metal substrate, an intermediate layer made of chromium applied thereto, a functional layer applied with the aid of a tungsten-containing precursor, using a PACVD method and a further functional layer deposited thereon, made of amorphous, diamond-like carbon, the precursor including a central atom of tungsten, at least one ligand of carbon monoxide and at least one ligand of an organic compound.

9. The method as recited in claim 8 wherein the organic compound is an at least diunsaturated hydrocarbon.

10. The method as recited in claim 8 wherein the precursor is a [(CO) 2 (diene) 2 W] compound.

11. A method comprising:
providing an organometallic compound as a precursor and producing a functional layer on a metal substrate using a PACVD method and the precursor, the functional layer being a tungsten-containing a-C:H layer.

12. The method as recited in claim 11 wherein the organometallic compound has tungsten as the central atom and carbon monoxide as well as polyunsaturated hydrocarbons as ligands.

Assignees

• Schaeffler Technologies Gmbh & Co Kg
• Schaeffler Technologies Gmbh & Co Kg

Inventors

• Schneider Andreas
• Musayev Yashar
• Hosenfeldt Tim Matthias

Classifications

• C23C28/347

  with layers adapted for cutting tools or wear applications · CPC title

• C23C28/343

  with at least one DLC or an amorphous carbon based layer, the layer being doped or not · CPC title

• C23C16/16

  from metal carbonyl compounds · CPC title

• Y10T428/12625

  Free carbon containing component · CPC title

• C23C16/452 Primary

  by activating reactive gas streams before {their} introduction into the reaction chamber, e.g. by {ionisation} or addition of reactive species · CPC title