Gas cluster reactor for anisotropic film growth
US-2015376791-A1 · Dec 31, 2015 · US
by activating reactive gas streams before {their} introduction into the reaction chamber, e.g. by {ionisation} or addition of reactive species
by activating reactive gas streams before {their} introduction into the reaction chamber, e.g. by {ionisation} or addition of reactive species · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/452 |
| Official title | by activating reactive gas streams before {their} introduction into the reaction chamber, e.g. by {ionisation} or addition of reactive species |
| Display label | by activating reactive gas streams before {their} introduction into the reaction chamber, e.g. by {ionisation} or addition of reactive species |
| Total patents | 741 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 66 |
| 2016 | 56 |
| 2017 | 60 |
| 2018 | 58 |
| 2019 | 72 |
| 2020 | 66 |
| 2021 | 74 |
| 2022 | 71 |
| 2023 | 62 |
| 2024 | 62 |
| 2025 | 80 |
| 2026 | 14 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Methods for forming layers on semiconductor substrates
US-9217201-B2 · Dec 22, 2015 · US
Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus and non-transitory computer-readable recording medium
US-9218959-B2 · Dec 22, 2015 · US
Apparatus for forming deposited film
US-9206513-B2 · Dec 8, 2015 · US
Method for producing a tribologically distressed laminate, a laminate and use of an organometallic compound for producing a functional layer of the laminate
US-2015337437-A1 · Nov 26, 2015 · US
Surface Treatment Apparatus
US-2015332893-A1 · Nov 19, 2015 · US
Gas cluster reactor for anisotropic film growth
US-2015332927-A1 · Nov 19, 2015 · US
Remote plasma source based cyclic cvd process for nanocrystalline diamond deposition
US-2015315707-A1 · Nov 5, 2015 · US
Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and recording medium
US-9177786-B2 · Nov 3, 2015 · US
Tungsten growth modulation by controlling surface composition
US-9169556-B2 · Oct 27, 2015 · US
Conformal deposition of silicon carbide films
US-2015303056-A1 · Oct 22, 2015 · US
Vapor deposition system
US-9157152-B2 · Oct 13, 2015 · US
Deposition apparatus, method of forming thin film using the deposition apparatus, and method of manufacturing organic light emitting display apparatus using the deposition apparatus
US-9142415-B2 · Sep 22, 2015 · US
Chemical control features in wafer process equipment
US-9132436-B2 · Sep 15, 2015 · US
Fluid distribution members and/or assemblies
US-9129778-B2 · Sep 8, 2015 · US
Cleaning process for cleaning amorphous carbon deposition residuals using low rf bias frequency applications
US-2015228463-A1 · Aug 13, 2015 · US
Rps assisted rf plasma source for semiconductor processing
US-2015221479-A1 · Aug 6, 2015 · US
FILM FORMING APPARATUS, METHOD OF FORMING LOW-PERMITTIVITY FILM, SiCO FILM, AND DAMASCENE INTERCONNECT STRUCTURE
US-2015214015-A1 · Jul 30, 2015 · US
Method of manufacturing semiconductor device
US-2015214044-A1 · Jul 30, 2015 · US
Multi-channel pyrolysis tubes, material deposition equipment including the same and associated methods
US-2015211115-A1 · Jul 30, 2015 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/452?
- CPC C23C16/452 is the Cooperative Patent Classification code for “by activating reactive gas streams before {their} introduction into the reaction chamber, e.g. by {ionisation} or addition of reactive species.”
- How many patents are filed under CPC C23C16/452 (by activating reactive gas streams before {their} introduction into the reaction chamber, e.g. by {ionisation} or addition of reactive species)?
- Our database includes 741 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/452 growing?
- Publication counts under this code: 62 in 2024 vs 80 in 2025 (latest complete years).