Compositions and methods for tungsten etching inhibition
US-2025283223-A1 · Sep 11, 2025 · US
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Wei Te Yu patents
Wei Te Yu is listed as an inventor on 20 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Wei Te Yu |
| Total patents | 20 |
| First publication | Aug 16, 2018 |
| Latest publication | Sep 11, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Compositions for tungsten etching inhibition
US-12378439-B2 · Aug 5, 2025 · US
Chemical mechanical polishing of substrates containing copper and ruthenium
US-12351737-B2 · Jul 8, 2025 · US
Compositions and methods for tungsten etching inhibition
US-2025215266-A1 · Jul 3, 2025 · US
Chemical mechanical polishing composition
US-11993729-B2 · May 28, 2024 · US
Chemical mechanical polishing of substrates containing copper and ruthenium
US-2024002698-A1 · Jan 4, 2024 · US
Chemical mechanical polishing of substrates containing copper and ruthenium
US-2023416570-A1 · Dec 28, 2023 · US
Chemical mechanical polishing of substrates containing copper and ruthenium
US-11725117-B2 · Aug 15, 2023 · US
Compositions and methods for tungsten etching inhibition
US-2022372632-A1 · Nov 24, 2022 · US
Compositions for tungsten etching inhibition
US-2022267643-A1 · Aug 25, 2022 · US
Recent patents
Latest publications not already listed above.
Chemical mechanical polishing of substrates containing copper and ruthenium
US-2022056307-A1 · Feb 24, 2022 · US
Chemical mechanical polishing of substrates containing copper and ruthenium
US-2022049125-A1 · Feb 17, 2022 · US
Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt comprising substrates
US-2021102093-A1 · Apr 8, 2021 · US
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates
US-10899945-B2 · Jan 26, 2021 · US
Composition for post chemical-mechanical-polishing cleaning
US-10844325-B2 · Nov 24, 2020 · US
Composition for post chemical-mechanical-polishing cleaning
US-10844333-B2 · Nov 24, 2020 · US
Chemical mechanical polishing composition
US-2020299547-A1 · Sep 24, 2020 · US
Composition for post chemical-mechanical-polishing cleaning
US-2019002802-A1 · Jan 3, 2019 · US
Composition for post chemical-mechanical-polishing cleaning
US-2018371371-A1 · Dec 27, 2018 · US
Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt comprising substrates
US-2018230333-A1 · Aug 16, 2018 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Basf Se | 20 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P52/403 | 17 |
| H01L21/3212 | 17 |
| C09G1/02 | 16 |
| C09K3/1409 | 11 |
| H10P52/402 | 11 |