Chemical mechanical polishing of substrates containing copper and ruthenium

Patent metadata

Field	Value
Publication number	US-12351737-B2
Application number	US-202318368032-A
Country	US
Kind code	B2
Filing date	Sep 14, 2023
Priority date	Dec 12, 2018
Publication date	Jul 8, 2025
Grant date	Jul 8, 2025

Abstract

The presently claimed invention relates to a chemical-mechanical polishing (CMP) composition and chemical-mechanical polishing (CMP) methods. The presently claimed invention particularly relates to a composition and process for chemical-mechanical polishing of substrates containing copper and ruthenium, specifically, semiconductor substrates containing copper and ruthenium.

First claim

The invention claimed is:

1. A method for the manufacture of semiconductor devices comprising the chemical-mechanical polishing of a substrate in the presence of a chemical-mechanical polishing (CMP) composition comprising
(A) at least one inorganic abrasive particle;
(B) at least one chelating agent selected from carboxylic acids;
(C) at least one corrosion inhibitor selected from unsubstituted or substituted triazoles;
(D) at least one non-ionic surfactant comprising at least one polyoxyalkylene group;
(E) at least one pad-cleaning agent selected from polymers and co-polymers of acrylic acid, methacrylic acid and maleic acid; wherein the polymers and co-polymers of acrylic acid, methacrylic acid, and maleic acid have a number average molecular weight in the range of ≥500 g/mol to ≤3000 g/mol and wherein the at least one pad-cleaning agent is selected from poly (acrylic acid-co-maleic acid) copolymers;
(F) at least one carbonate or hydrogen carbonate;
(G) at least one oxidizing agent selected from the group consisting of organic peroxides, inorganic peroxides, persulfates, iodates, periodic acids, periodates, permanganates, perchloric acids, perchlorates, bromic acids and bromates; and
(H) an aqueous medium.

2. The method according to claim 1 , wherein the at least one inorganic abrasive particle (A) is selected from the group consisting of metal oxides, metal nitrides, metal carbides, silicides, borides, ceramics, diamond, organic hybrid particles, inorganic hybrid particles and silica.

3. The method according to claim 1 , wherein the concentration of the at least one inorganic abrasive particle (A) is in the range of from ≥0.01 wt. % to ≤10 wt. %, based on the total weight of the chemical-mechanical polishing composition.

4. The method according to claim 1 , wherein the carboxylic acids are selected from the group consisting of dicarboxylic acids and tricarboxylic acids.

5. The method according to claim 1 , wherein the concentration of the at least one chelating agent (B) is in the range of from ≥0.001 wt. % to ≤2.5 wt. % based on the total weight of the chemical-mechanical polishing composition.

6. The method according to claim 1 , wherein the triazoles are selected from the group consisting of unsubstituted benzotriazoles, substituted benzotriazoles, unsubstituted 1,2,3-triazoles, substituted 1,2,3-triazoles, unsubstituted 1,2,4-triazoles and substituted 1,2,4-triazoles.

7. The method according to claim 1 , wherein the concentration of the at least one corrosion-inhibitor (C) is in the range of ≥0.001 wt. % to ≤1 wt. % of the total weight of the chemical-mechanical polishing composition.

8. The method according to claim 1 , wherein the concentration of the non-ionic surfactant comprising at least one polyoxyalkylene group (D) is in the range of ≥0.01 wt. % to ≤10 wt. % based on the total weight of the chemical-mechanical polishing composition.

9. The method according to claim 1 , wherein the concentration of the pad-cleaning agent (E) is in the range of ≥0.001 wt. % to ≤1 wt. % based on the total weight of the chemical-mechanical polishing composition.

10. The method according to claim 1 , wherein the pH of the chemical-mechanical polishing composition is in the range of from 8 to 11.

11. The method according to claim 1 , wherein the substrate comprises at least one copper layer and/or at least one ruthenium layer.

12. The method according to claim 1 , wherein the substrate comprises
(i) copper, and/or
(ii) tantalum, tantalum nitride, titanium, titanium nitride, ruthenium, or ruthenium alloys thereof.

Assignees

• Basf Se

Inventors

• Guevenc Haci Osman
• Lauter Michael
• Wei Te Yu
• Chiu Wei Lan
• Golzarian Reza M
• Proelss Julian
• Leunissen Leonardus

Classifications

• H10P52/403

  of conductive or resistive materials · CPC title

• C09K3/1463

  Aqueous liquid suspensions · CPC title

• C09K3/1409

  Abrasive particles per se (preparation of diamond C01B32/25) · CPC title

• C09G1/02 Primary

  containing abrasives or grinding agents {(abrasives as such C09K3/14; polishing of semi-conductors H10P52/40)} · CPC title

• H01L21/3212

  Electricity · mapped topic