Gas flow system
US-11211230-B2 · Dec 28, 2021 · US
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Wang Wei W patents
Wang Wei W is listed as an inventor on 21 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Wang Wei W |
| Total patents | 21 |
| First publication | Mar 17, 2015 |
| Latest publication | Dec 28, 2021 |
Notable patents
Publications ranked by popularity score, then publication date.
Methods and apparatus for co-sputtering multiple targets
US-11101117-B2 · Aug 24, 2021 · US
Methods and apparatus for multi-cathode substrate processing
US-11011357-B2 · May 18, 2021 · US
Gas flow system
US-2020335310-A1 · Oct 22, 2020 · US
Substrate support pedestal
US-2020312683-A1 · Oct 1, 2020 · US
Methods and apparatus for co-sputtering multiple targets
US-2020013597-A1 · Jan 9, 2020 · US
Methods and apparatus for co-sputtering multiple targets
US-10468238-B2 · Nov 5, 2019 · US
Physical vapor deposition processing systems target cooling
US-10325763-B2 · Jun 18, 2019 · US
In-situ temperature measurement in a noisy environment
US-10249522-B2 · Apr 2, 2019 · US
Methods and apparatus for multi-cathode substrate processing
US-2018240655-A1 · Aug 23, 2018 · US
Recent patents
Latest publications not already listed above.
Physical Vapor Deposition Processing Systems Target Cooling
US-2018211826-A1 · Jul 26, 2018 · US
Rotatable heated electrostatic chuck
US-9853579-B2 · Dec 26, 2017 · US
Bipolar collimator utilized in a physical vapor deposition chamber
US-9831074-B2 · Nov 28, 2017 · US
In-situ temperature measurement in a noisy environment
US-2017271182-A1 · Sep 21, 2017 · US
In-situ temperature measurement in a noisy environment
US-9673074-B2 · Jun 6, 2017 · US
Methods and apparatus for co-sputtering multiple targets
US-2017053784-A1 · Feb 23, 2017 · US
Substrate support with radio frequency (RF) return path
US-9340866-B2 · May 17, 2016 · US
Rotatable heated electrostatic chuck
US-2015170952-A1 · Jun 18, 2015 · US
Substrate heating pedestal having ceramic balls
US-2015144263-A1 · May 28, 2015 · US
Bipolar collimator utilized in a physical vapor deposition chamber
US-2015114823-A1 · Apr 30, 2015 · US
Substrate cleaning chamber and components
US-8980045-B2 · Mar 17, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 21 |
| Wang Wei W | 3 |
| Riker Martin | 2 |
| Ritchie Alan | 1 |
| Young Donny | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C23C14/50 | 8 |
| H01J37/3447 | 8 |
| C23C14/3407 | 6 |
| H01J37/3417 | 6 |
| H10P72/7612 | 6 |