Microlithographic apparatus and method of varying a light irradiance distribution

US9720336B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9720336-B2
Application numberUS-201514851107-A
CountryUS
Kind codeB2
Filing dateSep 11, 2015
Priority dateMar 28, 2013
Publication dateAug 1, 2017
Grant dateAug 1, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

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A microlithographic apparatus includes an objective that includes a transmission filter that is configured to variably modify a light irradiance distribution in a projection light path. The transmission filter includes a plurality of gas outlet apertures that are configured to emit gas flows that pass through a space through which projection light propagates during operation of the microlithographic apparatus. The transmission filter further includes a control unit which is configured to vary a number density of ozone molecules in the gas flows individually for each gas flow. In this manner it is possible to finally adjust the transmittance distribution of the transmission filter.

First claim

Opening claim text (preview).

The invention claimed is: 1. An apparatus, comprising: an objective comprising a transmission filter configured to variably modify a light irradiance distribution in a path of projection light through the objective, the transmission filter comprising: a plurality of gas outlet apertures configured so that, during operation of the transmission filter, the gas outlet apertures emit gas flows that intersect the path; and a control unit configured so that, during operation of the transmission filter, the control unit individually varies a number density of ozone molecules for each gas flow, wherein: the apparatus is a microlithographic apparatus; the control unit comprises a gas supply unit connected to the gas outlet apertures; the gas supply unit comprises: a gas container containing a gas comprising molecular oxygen; a channel connected at an end to the gas container and terminating at an opposite end at a gas outlet aperture; and a light source configured so that, during use of the transmission filter, the light source produces reaction light that is directed onto the gas guided in the channel so that at least a portion of the molecular oxygen contained in the gas dissociates into atomic oxygen which, in turn, re-combines with molecular oxygen to form ozone; the reaction light has a center wavelength less than 240 nm; and the transmission filter is configured so that, during use of the transmission filter, the number density of ozone molecules in the gas flows varies by varying the irradiance of the reaction light directed on the gas. 2. The apparatus of claim 1 , wherein the transmission filter is arranged at least substantially in a pupil plane of the objective. 3. The apparatus of claim 1 , wherein groups of outlet apertures are arranged in parallel planes that are spaced apart along an optical axis of the objective. 4. The apparatus of claim 3 , wherein plurality of gas outlet apertures configured so that, during operation of the transmission filter, the gas flows extend along directions that are different for each plane. 5. The apparatus of claim 1 , wherein the transmission filter comprises a transparent optical element arranged in the space so that, during operation of the transmission filter, the transparent optical element separates two adjacent gas flows. 6. The apparatus of claim 5 , wherein the transparent optical element comprises a plate, and the plate comprises parallel plane surfaces. 7. The apparatus of claim 1 , wherein the transmission filter is configured so that, during operation of the transmission filter, the gas flows comprise a purge gas. 8. The apparatus of claim 7 , wherein the control unit is configured so that, during operation of the transmission filter, the control unit varies a number density of purge gas atoms or molecules individually for each gas flow so that, for each gas flow when the number density of ozone molecules varies, the gas flow has a total pressure that does not vary by more than 0.5%. 9. The apparatus of claim 1 , further comprising a measurement system configured so that, during use of the transmission filter, the measurement system measures an angular light distribution in an image plane of the objective, wherein the measurement system is connected to the control unit so that, during use of the transmission filter, the light irradiance distribution in the projection light path varies in response to measurement signals produced by the measurement system. 10. The apparatus of claim 1 , further comprising an illumination system. 11. A method of using an apparatus, comprising: using the apparatus to project an image of an illuminated mask onto a photoresist, wherein the apparatus comprises the apparatus of claim 1 . 12. An objective, comprising: a transmission filter configured to variably modify a light irradiance distribution in a path of projection light through the objective, the transmission filter comprising: a plurality of gas outlet apertures configured so that, during operation of the transmission filter, the gas outlet apertures emit gas flows that intersect the path; and a control unit configured so that, during operation of the transmission filter, the control unit individually varies a number density of ozone molecules for each gas flow, wherein: the apparatus is a microlithographic apparatus; the control unit comprises a gas supply unit connected to the gas outlet apertures; the gas supply unit comprises: a gas container containing a gas comprising molecular oxygen; a channel connected at an end to the gas container and terminating at an opposite end at a gas outlet aperture; and a light source configured so that, during use of the transmission filter, the light source produces reaction light that is directed onto the gas guided in the channel so that at least a portion of the molecular oxygen contained in the gas dissociates into atomic oxygen which, in turn, re-combines with molecular oxygen to form ozone; the reaction light has a center wave-length less than 240 nm; and the transmission filter is configured so that, during use of the transmission filter, the number density of ozone molecules in the gas flows varies by varying the irradiance of the reaction light directed on the gas. 13. The objective of claim 12 , wherein the transmission filter is arranged at least substantially in a pupil plane of the objective. 14. The apparatus of claim 12 , wherein the control unit is configured so that, during operation of the transmission filter, the control unit varies a number density of purge gas atoms or molecules individually for each gas flow so that, for each gas flow when the number density of ozone molecules varies, the gas flow has a total pressure that does not vary by more than 0.5%.

Assignees

Inventors

Classifications

  • Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction · CPC title

  • Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift · CPC title

  • Optics for apodization or superresolution; Optical synthetic aperture systems · CPC title

  • Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA] · CPC title

  • of optical system · CPC title

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What does patent US9720336B2 cover?
A microlithographic apparatus includes an objective that includes a transmission filter that is configured to variably modify a light irradiance distribution in a projection light path. The transmission filter includes a plurality of gas outlet apertures that are configured to emit gas flows that pass through a space through which projection light propagates during operation of the microlithogr…
Who is the assignee on this patent?
Zeiss Carl Smt Gmbh
What technology area does this patent fall under?
Primary CPC classification G03F7/70091. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 01 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).