Euv exposure apparatus with reflective elements having reduced influence of temperature variation

Patent metadata

Field	Value
Publication number	US-2018299784-A1
Application number	US-201816013687-A
Country	US
Kind code	A1
Filing date	Jun 20, 2018
Priority date	Jul 30, 2010
Publication date	Oct 18, 2018
Grant date	—

Abstract

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

First claim

What is claimed is:

1 . A projection lens of an EUV-lithographic projection exposure system, comprising
a plurality of reflective optical elements M i , each comprising a body MB i and a reflective surface MS i for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light with a wavelength in a wavelength range of less than 50 nm, being reflected from the reticle while illuminated by an illumination system of the EUV-lithographic projection exposure system, wherein the lens comprises support means for passively or actively supporting at least one optical element M k , the support means comprising a temperature sensitive element selected from the group consisting of linking points, bipod structures, linking elements, support element and housing structure, wherein the temperature sensitive element is controlled to a constant or to a predefined temperature, the lens further comprises a first tempering element for heating and/or cooling the at least one optical element M k to a temperature T k , a second tempering element for tempering the temperature sensitive element to the predefined temperature, wherein the second tempering element is spatially arranged between the temperature sensitive element and the first tempering element.

2 . The projection lens of claim 1 , wherein the heated or cooled reflective optical element M k comprises a material with a temperature dependent coefficient of thermal expansion which is zero at a zero cross temperature T 0k which is different from the predefined temperature of the temperature sensitive element.

3 . The projection lens of claim 1 , wherein the predefined temperature of the temperature sensitive element is at a reference temperature T Ref .

4 . The projection lens of claim 3 , wherein the zero cross temperature T 0k is lower than the reference temperature T Ref , or is at least 6 K higher than the reference temperature T Ref .

5 . The projection lens of claim 1 , wherein the reflective optical element M k is in at least one spatial dimension homogeneously subjected to a heat transfer caused by the first tempering element.

6 . The projection lens of claim 5 further comprising an actuator, wherein the optical element M k is connected to the actuator for a translational movement in at least one direction.

7 . The projection lens of claim 1 , wherein the first tempering element is located on a side of a body MB k of the at least one optical element M k which is opposite to its reflective surface MS k .

8 . The projection lens of claim 1 , wherein the first tempering element includes a Peltier element or a radiation source, emitting a radiation comprising a wavelength to which a body MB k of the at least one optical element M k is semitransparent.

9 . The projection lens of claim 1 , wherein the second tempering element is located on a side of the first tempering element which is opposite to a body MB k of the at least one optical element M k .

10 . The projection lens of claim 8 , wherein the Peltier element extends parallel to a surface of the at least one optical element M k which is opposite to its reflective surface MS k .

11 . The projection lens of claim 8 , wherein the Peltier element has such a size that at least one side of the reflective surface MS k or one side of the at least one optical element M k can be covered.

12 . The projection lens of claim 8 , wherein the Peltier element is coupled to the second tempering element, working as a cooler, by thermally coupling one surface of the cooler to a surface of the Peltier element.

13 . The projection lens of claim 1 , wherein the second tempering element, working as a cooler, comprises a sandwich structure such that a surface of the cooler which is in thermal contact with the first tempering element is separated from a surface of the cooler which is oriented into the direction of the temperature sensitive element.

14 . The projection lens of claim 1 , wherein the first tempering element comprises several Peltier elements, each controllable by a temperature control system.

15 . The projection lens of claim 1 , wherein:
the heated or cooled reflective optical element M k comprises a material with a temperature dependent coefficient of thermal expansion which is zero at a zero cross temperature T 0k which is different from the predefined temperature of the temperature sensitive element; wherein the predefined temperature of the temperature sensitive element is at a reference temperature T Ref ; wherein without tempering a body MB k of the at least one optical element M k with the first tempering element the exposure of the reflective surface MS k with EUV light, being reflected by the illuminated reticle and comprising a spatial distribution of angular, polarization and intensity in accordance with an illumination setting, resulting in temperature distributions ΔT k (x,y,z)=(T k (x,y,z)−T Ref ), of the body MB k relative to the reference temperature T Ref with an average and a maximum temperature ΔT kav and ΔT kmax ; and wherein the zero cross temperature T 0k is higher than the maximum of the reference temperature T Ref and the respective average or maximum temperature based on the spatial temperature distribution ΔT k (x,y,z) added by the reference temperature (ΔT kav +T Ref or ΔT kmax +T Ref ), expressed as T 0k >max(T Ref , ΔT kav +T Ref ) or T 0k >max(T Ref , ΔT kmax +T Ref ).

16 . The projection lens of claim 5 , wherein
the heated or cooled reflective optical element M k comprises a material with a temperature dependent coefficient of thermal expansion which is zero at a zero cross temperature T 0k which is different from the predefined temperature of the temperature sensitive element; wherein the predefined temperature of the temperature sensitive element is at a reference temperature T Ref ; wherein the material with a zero cross temperature T 0k varies regarding its real value of the zero cross temperature due to manufacturing, resulting in a manufacturing tolerance ΔT 0k such that the real value of the zero cross temperature is within the interval T 0k ±ΔT 0k , and wherein the zero cross temperature T 0k is higher than an increased maximum of a reference temperature T Ref and the respective average or maximum temperature based on the spatial temperature distribution ΔT k (x,y,z) and added by the reference temperature (ΔT kav +T Ref or ΔT kmax +T Ref ), the maximum is increased by the absolute value of the manufacturing tolerance ΔT 0k , expressed as T 0k >max(T Ref , ΔT kav +T Ref )+|ΔT 0k |, T 0k >max(T Ref , ΔT kmax +T Ref )+|ΔT 0k |.

17 . The projection lens of claim 1 further comprising:
a pressure control system for the control of pressure Δp within a surrounding of the at least one reflective optical element M k ,
wherein the control is based on a parameter selected from the group consisting of the temperature of the reflective optical element M k , the time, a parameter which directly or indirectly influences the temperature of the optical element M k , an illumination setting, a change of the reticle, thermally or mechanically induced optical aberration data of the optical element M k or the projection lens and an output parameter from a model,
the model input comprising data selected from the group consisting of the temperature of the reflective optical element M k , the time, a parameter which directly or indirectly influences the temperature of the optical element M k , an illumination setting, the

Assignees

• Zeiss Carl Smt Gmbh
• Asml Netherlands Bv

Inventors

• Baer Norman
• Loering Ulrich
• Natt Oliver
• Wittich Gero
• Laufer Timo
• Kuerz Peter
• Limbach Guido
• Hembacher Stefan
• Walter Holger
• Kwan Yim-Bun-Patrick
• Hauf Markus
• Stickel Franz-Josef
• Van Schoot Jan

Classifications

• B82Y10/00 Primary

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• G03B27/542

  for copying cameras, reflex exposure lighting · CPC title

• G02B17/0647

  using more than three curved mirrors (G02B17/0668, G02B17/0694 take precedence) · CPC title

• G02B3/00

  Simple or compound lenses · CPC title

• G02B5/08

  Mirrors {(vehicle mirrors involving special optical features B60R1/08)} · CPC title