Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxide
US-10954411-B2 · Mar 23, 2021 · US
Tettey Kwadwo E is listed as an inventor on 8 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Tettey Kwadwo E |
| Total patents | 8 |
| First publication | Mar 28, 2019 |
| Latest publication | Mar 23, 2021 |
Publications ranked by popularity score, then publication date.
US-10954411-B2 · Mar 23, 2021 · US
US-2020362198-A1 · Nov 19, 2020 · US
US-10822524-B2 · Nov 3, 2020 · US
US-10787592-B1 · Sep 29, 2020 · US
US-10626298-B1 · Apr 21, 2020 · US
US-10584265-B2 · Mar 10, 2020 · US
US-2019185714-A1 · Jun 20, 2019 · US
US-2019092972-A1 · Mar 28, 2019 · US
Latest publications not already listed above.
No data yet.
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Rohm & Haas Elect Materials Cmp Holdings Inc | 8 |
| Rohm And Haas Electronic Mat Cmp Holdings I | 2 |
| Rohm And Haas Electronic Mat Cmp Holdings | 1 |
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C09G1/02 | 8 |
| C09K3/1409 | 7 |
| C09K3/1463 | 7 |
| B24B37/044 | 6 |
| H10P95/062 | 5 |