Computational metrology
US-12461451-B2 · Nov 4, 2025 · US
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Segers Bart Peter Bert patents
Segers Bart Peter Bert is listed as an inventor on 21 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Segers Bart Peter Bert |
| Total patents | 21 |
| First publication | Dec 13, 2016 |
| Latest publication | Nov 4, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Computational metrology
US-12189302-B2 · Jan 7, 2025 · US
Computational metrology
US-2022260925-A1 · Aug 18, 2022 · US
Metrology apparatus and method for determining a characteristic relating to one or more structures on a substrate
US-11385554-B2 · Jul 12, 2022 · US
Computational metrology
US-11347150-B2 · May 31, 2022 · US
Method and apparatus for determining a fingerprint of a performance parameter
US-11194258-B2 · Dec 7, 2021 · US
Computational metrology
US-2021349395-A1 · Nov 11, 2021 · US
Computational metrology
US-11067902-B2 · Jul 20, 2021 · US
Computational metrology
US-2021191278-A1 · Jun 24, 2021 · US
Computational metrology
US-10990018-B2 · Apr 27, 2021 · US
Recent patents
Latest publications not already listed above.
Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method
US-10895811-B2 · Jan 19, 2021 · US
Computational metrology
US-2020249576-A1 · Aug 6, 2020 · US
Method and apparatus for determining a fingerprint of a performance parameter
US-2020233310-A1 · Jul 23, 2020 · US
Method and apparatus for determining a fingerprint of a performance parameter
US-10649342-B2 · May 12, 2020 · US
Methods and Patterning Devices and Apparatuses for Measuring Focus Performance of a Lithographic Apparatus, Device Manufacturing Method
US-2020117101-A1 · Apr 16, 2020 · US
Method of calibrating focus measurements, measurement method and metrology apparatus, lithographic system and device manufacturing method
US-10571812-B2 · Feb 25, 2020 · US
Metrology Apparatus and Method for Determining a Characteristic Relating to One or More Structures on a Substrate
US-2020026182-A1 · Jan 23, 2020 · US
Computational metrology
US-2019361358-A1 · Nov 28, 2019 · US
Method and apparatus for determining a fingerprint of a performance parameter
US-2019324371-A1 · Oct 24, 2019 · US
Method of Calibrating Focus Measurements, Measurement Method and Metrology Apparatus, Lithographic System and Device Manufacturing Method
US-2019056673-A1 · Feb 21, 2019 · US
Lithographic apparatus and method
US-9519224-B2 · Dec 13, 2016 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Asml Netherlands Bv | 21 |
| Asml Natherlands B V | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70641 | 21 |
| G03F7/70683 | 15 |
| G03F7/70625 | 15 |
| G03F7/705 | 14 |
| G03F7/70633 | 10 |