Selective deposition of high-k dielectric material in gate interface
US-2026032985-A1 · Jan 29, 2026 · US
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Saly Mark J patents
Saly Mark J is listed as an inventor on 35 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Saly Mark J |
| Total patents | 35 |
| First publication | Jul 30, 2020 |
| Latest publication | Jan 29, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Dry etching with etch byproduct self-cleaning
US-2026011569-A1 · Jan 8, 2026 · US
Method of metal oxide infiltration into photoresist
US-12486559-B2 · Dec 2, 2025 · US
Dry etching with etch byproduct self-cleaning
US-12469715-B2 · Nov 11, 2025 · US
Electronic device fabrication using area-selective deposition
US-12438050-B2 · Oct 7, 2025 · US
Method for forming silicon-phosphorous materials
US-2025283251-A1 · Sep 11, 2025 · US
Benzyl compound passivation for selective deposition and selective etch protection
US-12394620-B2 · Aug 19, 2025 · US
Method for forming silicon-phosphorous materials
US-12338547-B2 · Jun 24, 2025 · US
Enhanced etch selectivity using halides
US-12315733-B2 · May 27, 2025 · US
Corrosion resistant film on a chamber component and methods of depositing thereof
US-12305275-B2 · May 20, 2025 · US
Recent patents
Latest publications not already listed above.
Reactive-ion deposition processes for dielectric material formation
US-2025046602-A1 · Feb 6, 2025 · US
Halogen-free molybdenum-containing precursors for deposition of molybdenum
US-2024425536-A1 · Dec 26, 2024 · US
Low-temperature deposition processes to form molybdenum-based materials with improved resistivity
US-2024360549-A1 · Oct 31, 2024 · US
Atomic layer deposition of silicon-carbon-and-nitrogen-containing materials
US-2024332001-A1 · Oct 3, 2024 · US
Electronic device fabrication using area-selective deposition
US-2024282632-A1 · Aug 22, 2024 · US
Enhanced etch selectivity using halides
US-2024266180-A1 · Aug 8, 2024 · US
Metal-doped carbon hardmasks
US-12014925-B2 · Jun 18, 2024 · US
Benzyl compound passivation for selective deposition and selective etch protection
US-2024145232-A1 · May 2, 2024 · US
Dry etching with etch byproduct self-cleaning
US-2024128091-A1 · Apr 18, 2024 · US
Methods for selective dry etching gallium oxide
US-11942330-B2 · Mar 26, 2024 · US
Corrosion resistant film on a chamber component and methods of depositing thereof
US-11932938-B2 · Mar 19, 2024 · US
Corrosion resistant film on a chamber component and methods of depositing thereof
US-2024003003-A1 · Jan 4, 2024 · US
Method for forming silicon-phosphorous materials
US-2023243068-A1 · Aug 3, 2023 · US
Method for forming silicon-phosphorous materials
US-11649560-B2 · May 16, 2023 · US
Method of metal oxide infiltration into photoresist
US-2023002878-A1 · Jan 5, 2023 · US
Methods to fabricate dual pore devices
US-11536708-B2 · Dec 27, 2022 · US
Metal-doped carbon hardmasks
US-2022384188-A1 · Dec 1, 2022 · US
Methods for selective dry etching gallium oxide
US-2022301883-A1 · Sep 22, 2022 · US
Methods for selective dry etching gallium oxide
US-11398388-B2 · Jul 26, 2022 · US
Methods for selective dry etching gallium oxide
US-2022076960-A1 · Mar 10, 2022 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 35 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P50/73 | 11 |
| H10P50/285 | 9 |
| H10P14/6339 | 7 |
| H10P14/6939 | 7 |
| H10P14/6336 | 7 |