Oxide semiconductor thin film, manufacturing method for oxide semiconductor thin film, and thin film transistor using oxide semiconductor thin film
US-2019081182-A1 · Mar 14, 2019 · US
This page is not indexed by search engines while we improve data quality.
Nishimura Eiichiro patents
Nishimura Eiichiro is listed as an inventor on 24 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Nishimura Eiichiro |
| Total patents | 24 |
| First publication | Jan 21, 2016 |
| Latest publication | Mar 14, 2019 |
Notable patents
Publications ranked by popularity score, then publication date.
Oxide sintered body and sputtering target
US-2019062900-A1 · Feb 28, 2019 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-10128108-B2 · Nov 13, 2018 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-10000842-B2 · Jun 19, 2018 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-9941415-B2 · Apr 10, 2018 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2017345653-A1 · Nov 30, 2017 · US
Oxide semiconductor thin film and thin film transistor
US-9768316-B2 · Sep 19, 2017 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-9732004-B2 · Aug 15, 2017 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-9688580-B2 · Jun 27, 2017 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-9670578-B2 · Jun 6, 2017 · US
Recent patents
Latest publications not already listed above.
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-9670577-B2 · Jun 6, 2017 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2017137324-A1 · May 18, 2017 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2017130329-A1 · May 11, 2017 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2017092780-A1 · Mar 30, 2017 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2017076943-A1 · Mar 16, 2017 · US
Sintered oxide, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2017077243-A1 · Mar 16, 2017 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2017047206-A1 · Feb 16, 2017 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2017029336-A1 · Feb 2, 2017 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2017029335-A1 · Feb 2, 2017 · US
Oxynitride semiconductor thin film
US-9543447-B2 · Jan 10, 2017 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2016348229-A1 · Dec 1, 2016 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2016348230-A1 · Dec 1, 2016 · US
Oxide semiconductor thin film and thin film transistor
US-2016163865-A1 · Jun 9, 2016 · US
Oxynitride semiconductor thin film
US-2016020328-A1 · Jan 21, 2016 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Sumitomo Metal Mining Co | 24 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P14/3434 | 24 |
| H10P14/22 | 22 |
| C23C14/3414 | 22 |
| C04B2235/3286 | 20 |
| C04B35/01 | 20 |