Gas cleaning method, method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus
US-2023294145-A1 · Sep 21, 2023 · US
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Nakamura Iwao patents
Nakamura Iwao is listed as an inventor on 4 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Nakamura Iwao |
| Total patents | 4 |
| First publication | May 21, 2015 |
| Latest publication | Sep 21, 2023 |
Notable patents
Publications ranked by popularity score, then publication date.
Reaction tube and method of manufacturing semiconductor device
US-2020312631-A1 · Oct 1, 2020 · US
Substrate processing apparatus, method for manufacturing semiconductor device, and recording medium
US-9816182-B2 · Nov 14, 2017 · US
Substrate processing apparatus, method for manufacturing semiconductor device, and recording medium
US-2015140835-A1 · May 21, 2015 · US
Recent patents
Latest publications not already listed above.
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Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Kokusai Electric Corp | 2 |
| Hitachi Int Electric Inc | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C23C16/52 | 4 |
| H10P72/0402 | 3 |
| H10P72/0602 | 3 |
| H10P72/0434 | 3 |
| H10P72/0432 | 3 |