Process-induced displacement characterization during semiconductor production
US-11682570-B2 · Jun 20, 2023 · US
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Levy Ady patents
Levy Ady is listed as an inventor on 28 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Levy Ady |
| Total patents | 28 |
| First publication | Apr 23, 2015 |
| Latest publication | Jun 20, 2023 |
Notable patents
Publications ranked by popularity score, then publication date.
System and method for tilt calculation based on overlay metrology measurements
US-11360398-B2 · Jun 14, 2022 · US
Process-Induced Displacement Characterization During Semiconductor Production
US-2022005714-A1 · Jan 6, 2022 · US
Process-induced displacement characterization during semiconductor production
US-11164768-B2 · Nov 2, 2021 · US
System and method for tilt calculation based on overlay metrology measurements
US-2021149313-A1 · May 20, 2021 · US
System and method for process-induced distortion prediction during wafer deposition
US-10475712-B2 · Nov 12, 2019 · US
System and method for field-by-field overlay process control using measured and estimated field parameters
US-10466596-B2 · Nov 5, 2019 · US
Process-Induced Displacement Characterization During Semiconductor Production
US-2019333794-A1 · Oct 31, 2019 · US
Apparatus and methods for detecting overlay errors using scatterometry
US-10451412-B2 · Oct 22, 2019 · US
Overlay control with non-zero offset prediction
US-10409171-B2 · Sep 10, 2019 · US
Recent patents
Latest publications not already listed above.
Process-sensitive metrology systems and methods
US-10216096-B2 · Feb 26, 2019 · US
Overlay Control with Non-Zero Offset Prediction
US-2018253017-A1 · Sep 6, 2018 · US
Model-based hot spot monitoring
US-10030965-B2 · Jul 24, 2018 · US
Method and system for determining in-plane distortions in a substrate
US-10024654-B2 · Jul 17, 2018 · US
System and Method for Process-Induced Distortion Prediction During Wafer Deposition
US-2018096906-A1 · Apr 5, 2018 · US
Feed forward of metrology data in a metrology system
US-9903711-B2 · Feb 27, 2018 · US
On-device metrology
US-9875946-B2 · Jan 23, 2018 · US
Small-angle scattering X-ray metrology systems and methods
US-9846132-B2 · Dec 19, 2017 · US
Apparatus for measuring overlay errors
US-9702693-B2 · Jul 11, 2017 · US
Method and system for universal target based inspection and metrology
US-9576861-B2 · Feb 21, 2017 · US
Process-Sensitive Metrology Systems and Methods
US-2017045826-A1 · Feb 16, 2017 · US
Model-Based Hot Spot Monitoring
US-2016327605-A1 · Nov 10, 2016 · US
Apparatus for measuring overlay errors
US-2016313116-A1 · Oct 27, 2016 · US
Method and System for Determining In-Plane Distortions in a Substrate
US-2016290789-A1 · Oct 6, 2016 · US
Feed Forward of Metrology Data in a Metrology System
US-2016290796-A1 · Oct 6, 2016 · US
Acquisition of information for a construction site
US-9222771-B2 · Dec 29, 2015 · US
System and Method for Field-By-Field Overlay Process Control Using Measured and Estimated Field Parameters
US-2015241790-A1 · Aug 27, 2015 · US
Small-angle scattering x-ray metrology systems and methods
US-2015110249-A1 · Apr 23, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Kla Tencor Corp | 25 |
| Kla Corp | 5 |
| Kla—Tencor Corp | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70633 | 13 |
| H10P74/203 | 10 |
| H10P74/23 | 9 |
| G03F7/70616 | 8 |
| G03F7/705 | 8 |