Radiofrequency Signal Filter Arrangement for Plasma Processing System
US-2026045452-A1 · Feb 12, 2026 · US
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Ji Bing patents
Ji Bing is listed as an inventor on 39 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Ji Bing |
| Total patents | 39 |
| First publication | Apr 16, 2015 |
| Latest publication | Feb 12, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Plasma uniformity control using a pulsed magnetic field
US-12525458-B2 · Jan 13, 2026 · US
Radiofrequency signal filter arrangement for plasma processing system
US-12476082-B2 · Nov 18, 2025 · US
Systems and methods for using binning to increase power during a low frequency cycle
US-2025273433-A1 · Aug 28, 2025 · US
Magnetic field control system
US-12387916-B2 · Aug 12, 2025 · US
Low frequency RF generator and associated electrostatic chuck
US-12387909-B2 · Aug 12, 2025 · US
Systems and methods for controlling a plasma sheath characteristic
US-12362159-B2 · Jul 15, 2025 · US
Systems and methods for optimizing power delivery to an electrode of a plasma chamber
US-12354840-B2 · Jul 8, 2025 · US
Systems and methods for reducing reflected power associated with an hf rf generator efficiently
US-2025140526-A1 · May 1, 2025 · US
Systems and methods for using binning to increase power during a low frequency cycle
US-12266505-B2 · Apr 1, 2025 · US
Recent patents
Latest publications not already listed above.
Uniformity control circuit for impedance match
US-2025062102-A1 · Feb 20, 2025 · US
Edge capacitively coupled plasma chamber structure
US-2025006470-A1 · Jan 2, 2025 · US
Uniformity control circuit for impedance match
US-12165844-B2 · Dec 10, 2024 · US
Impedance match with an elongated rf strap
US-2024395504-A1 · Nov 28, 2024 · US
Impedance match with an elongated RF strap
US-12080518-B2 · Sep 3, 2024 · US
Systems and methods for optimizing power delivery to an electrode of a plasma chamber
US-2024186112-A1 · Jun 6, 2024 · US
High speed synchronization of plasma source/bias power delivery
US-11935726-B2 · Mar 19, 2024 · US
Systems and methods for optimizing power delivery to an electrode of a plasma chamber
US-11908660-B2 · Feb 20, 2024 · US
Plasma uniformity control using a static magnetic field
US-2023298866-A1 · Sep 21, 2023 · US
Magnetic field control system
US-2023282455-A1 · Sep 7, 2023 · US
Low frequency rf generator and associated electrostatic chuck
US-2023274914-A1 · Aug 31, 2023 · US
Plasma discharge uniformity control using magnetic fields
US-2023260768-A1 · Aug 17, 2023 · US
Uniformity control circuit for impedance match
US-2023253184-A1 · Aug 10, 2023 · US
Systems and methods for controlling a plasma sheath characteristic
US-2023245874-A1 · Aug 3, 2023 · US
Plasma uniformity control using a pulsed magnetic field
US-2023223242-A1 · Jul 13, 2023 · US
Duty cycle control to achieve uniformity
US-2023215694-A1 · Jul 6, 2023 · US
Impedance match with an elongated rf strap
US-2023081542-A1 · Mar 16, 2023 · US
Optimization of Radiofrequency Signal Ground Return in Plasma Processing System
US-2023059495-A1 · Feb 23, 2023 · US
Radiofrequency Signal Filter Arrangement for Plasma Processing System
US-2023054699-A1 · Feb 23, 2023 · US
Systems and methods for using binning to increase power during a low frequency cycle
US-2023007885-A1 · Jan 12, 2023 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Lam Res Corp | 38 |
| Mks Instr Inc | 4 |
| Lsi Corp | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H01J37/32183 | 24 |
| H01J37/32165 | 20 |
| H01J37/32091 | 18 |
| H01J37/32174 | 17 |
| H01J37/32155 | 13 |