CMP slurry composition for polishing copper and copper film polishing method using the same
US-12540256-B2 · Feb 3, 2026 · US
Hwang Ja Young is listed as an inventor on 14 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Hwang Ja Young |
| Total patents | 14 |
| First publication | Apr 2, 2015 |
| Latest publication | Feb 3, 2026 |
Publications ranked by popularity score, then publication date.
US-12540256-B2 · Feb 3, 2026 · US
US-2023272242-A1 · Aug 31, 2023 · US
US-2023227695-A1 · Jul 20, 2023 · US
US-10224303-B2 · Mar 5, 2019 · US
US-9865558-B2 · Jan 9, 2018 · US
US-2017162531-A1 · Jun 8, 2017 · US
US-9657196-B2 · May 23, 2017 · US
US-9490229-B2 · Nov 8, 2016 · US
US-9490228-B2 · Nov 8, 2016 · US
US-9331044-B2 · May 3, 2016 · US
Latest publications not already listed above.
US-2016064349-A1 · Mar 3, 2016 · US
US-2015318257-A1 · Nov 5, 2015 · US
US-2015123292-A1 · May 7, 2015 · US
US-2015091192-A1 · Apr 2, 2015 · US
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Samsung Sdi Co Ltd | 13 |
| Park Kyoung Soo | 1 |
| Kwon Soon Young | 1 |
| Kim Ji Yeon | 1 |
| Park Young Woo | 1 |
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10W72/354 | 11 |
| H10W72/352 | 11 |
| H10W72/325 | 11 |
| H10W90/734 | 11 |
| H01L24/29 | 11 |