Substrate processing apparatus and substrate processing method using the same
US-12592366-B2 · Mar 31, 2026 · US
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Hur Minyoung patents
Hur Minyoung is listed as an inventor on 32 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Hur Minyoung |
| Total patents | 32 |
| First publication | May 21, 2020 |
| Latest publication | Mar 31, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Plasma etching apparatus
US-2025379038-A1 · Dec 11, 2025 · US
Plasma control apparatus
US-2025349516-A1 · Nov 13, 2025 · US
Apparatus for processing a substrate
US-2025316458-A1 · Oct 9, 2025 · US
Plasma processing device
US-2025273442-A1 · Aug 28, 2025 · US
Plasma baffle, substrate processing apparatus including the same, and substrate processing method using the same
US-2025266247-A1 · Aug 21, 2025 · US
Plasma etching devices and methods for fabricating semiconductor devices using the same
US-2025266242-A1 · Aug 21, 2025 · US
Plasma processing apparatus
US-2025259827-A1 · Aug 14, 2025 · US
Manufacturing apparatus of semiconductor device
US-2025246467-A1 · Jul 31, 2025 · US
Sensor device for semiconductor equipment, method of operating a sensor device, and system including a sensor device
US-2025189347-A1 · Jun 12, 2025 · US
Recent patents
Latest publications not already listed above.
Substrate processing method
US-2025183005-A1 · Jun 5, 2025 · US
Plasma baffle, substrate processing apparatus including the same, and substrate processing method using the same
US-12322577-B2 · Jun 3, 2025 · US
Method of processing a substrate
US-2025174433-A1 · May 29, 2025 · US
Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing wafer
US-2025146917-A1 · May 8, 2025 · US
Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing wafer
US-12222362-B2 · Feb 11, 2025 · US
Impedance measurement jig and method of controlling a substrate-processing apparatus using the jig
US-12210045-B2 · Jan 28, 2025 · US
Plasma control device and plasma control method
US-2024234094-A9 · Jul 11, 2024 · US
Plasma etching method and semiconductor device fabrication method including the same
US-12020903-B2 · Jun 25, 2024 · US
Plasma control device and plasma control method
US-2024136155-A1 · Apr 25, 2024 · US
Plasma etching apparatus and operating method thereof
US-2024128056-A1 · Apr 18, 2024 · US
Substrate processing apparatus and substrate processing method using the same
US-2023282453-A1 · Sep 7, 2023 · US
Plasma baffle, substrate processing apparatus including the same, and substrate processing method using the same
US-2023245864-A1 · Aug 3, 2023 · US
Plasma baffle, substrate processing apparatus including the same, and substrate processing method using the same
US-2023187185-A1 · Jun 15, 2023 · US
Plasma etching method and semiconductor device fabrication method including the same
US-2023084124-A1 · Mar 16, 2023 · US
Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing wafer
US-2023060400-A1 · Mar 2, 2023 · US
Impedance measurement jig and method of controlling a substrate-processing apparatus using the jig
US-2023010881-A1 · Jan 12, 2023 · US
Plasma etching method and semiconductor device fabrication method including the same
US-11545341-B2 · Jan 3, 2023 · US
Electrostatic chuck and plasma processing apparatus including the same
US-11398397-B2 · Jul 26, 2022 · US
Plasma control apparatus and plasma processing system including the same
US-11282679-B2 · Mar 22, 2022 · US
Plasma etching method and semiconductor device fabrication method including the same
US-2021104382-A1 · Apr 8, 2021 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Samsung Electronics Co Ltd | 32 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H01J2237/334 | 18 |
| H10P50/242 | 13 |
| H01J37/32715 | 12 |
| H01J37/32183 | 11 |
| H01J37/32091 | 11 |