Advanced load port for photolithography mask inspection tool
US-12298664-B2 · May 13, 2025 · US
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Chung Jen-Yang patents
Chung Jen-Yang is listed as an inventor on 38 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Chung Jen-Yang |
| Total patents | 38 |
| First publication | Feb 12, 2015 |
| Latest publication | May 13, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
EUV light source and apparatus for lithography
US-12167525-B2 · Dec 10, 2024 · US
Extreme ultraviolet control system
US-12044975-B2 · Jul 23, 2024 · US
Advanced load port for photolithography mask inspection tool
US-2024168387-A1 · May 23, 2024 · US
Advanced load port for photolithography mask inspection tool
US-11921431-B2 · Mar 5, 2024 · US
Euv light source and apparatus for lithography
US-2023389168-A1 · Nov 30, 2023 · US
EUV light source and apparatus for lithography
US-11832372-B2 · Nov 28, 2023 · US
Advanced load port for photolithography mask inspection tool
US-2023176488-A1 · Jun 8, 2023 · US
Advanced load port for photolithography mask inspection tool
US-11592754-B2 · Feb 28, 2023 · US
Extreme ultraviolet control system
US-2023030134-A1 · Feb 2, 2023 · US
Recent patents
Latest publications not already listed above.
Advanced load port for photolithography mask inspection tool
US-2022342321-A1 · Oct 27, 2022 · US
Extreme ultraviolet control system
US-11467498-B2 · Oct 11, 2022 · US
Euv light source and apparatus for lithography
US-2022191999-A1 · Jun 16, 2022 · US
EUV light source and apparatus for lithography
US-11272606-B2 · Mar 8, 2022 · US
Process system and operating method thereof
US-11237482-B2 · Feb 1, 2022 · US
Extreme ultraviolet control system
US-2021223701-A1 · Jul 22, 2021 · US
Extreme ultraviolet control system for adjusting droplet illumination parameters
US-10969690-B2 · Apr 6, 2021 · US
Collector pellicle
US-10880981-B2 · Dec 29, 2020 · US
Extreme ultraviolet radiation source
US-10877190-B2 · Dec 29, 2020 · US
Semiconductor integrated circuit fabrication with pattern-reversing process
US-10685846-B2 · Jun 16, 2020 · US
Process system and operating method thereof
US-2020057381-A1 · Feb 20, 2020 · US
Extreme ultraviolet radiation source
US-2020057181-A1 · Feb 20, 2020 · US
Lithography apparatus and method for protecting a reticle
US-10274844-B1 · Apr 30, 2019 · US
Extreme ultraviolet control system
US-2019101831-A1 · Apr 4, 2019 · US
Collector pellicle
US-2019104604-A1 · Apr 4, 2019 · US
Euv light source and apparatus for lithography
US-2018376575-A1 · Dec 27, 2018 · US
Extreme ultraviolet lithography system with debris trapper on exhaust line
US-10162277-B2 · Dec 25, 2018 · US
Extreme Ultraviolet Lithography System with Debris Trapper on Exhaust Line
US-2018173117-A1 · Jun 21, 2018 · US
Pixel array substrate and liquid crystal display panel
US-2017082901-A1 · Mar 23, 2017 · US
Pixel array substrate and liquid crystal display panel
US-9541796-B2 · Jan 10, 2017 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Taiwan Semiconductor Mfg Co Ltd | 29 |
| Au Optronics Corp | 10 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70033 | 20 |
| H05G2/008 | 16 |
| H05G2/0094 | 12 |
| G03F7/2004 | 12 |
| G03F7/70916 | 10 |