Apparatuses for cleaning a multi-station semiconductor processing chamber
US-12593641-B2 · Mar 31, 2026 · US
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Batzer Rachel E patents
Batzer Rachel E is listed as an inventor on 28 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Batzer Rachel E |
| Total patents | 28 |
| First publication | Sep 29, 2016 |
| Latest publication | Mar 31, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Hub with gas deflectors
US-D1114751-S · Feb 24, 2026 · US
Independently adjustable flowpath conductance in multi-station semiconductor processing
US-2026043135-A1 · Feb 12, 2026 · US
Threaded nozzle insert
US-D1099688-S · Oct 28, 2025 · US
Pedestal setup using camera wafer
US-12362153-B2 · Jul 15, 2025 · US
Deposition of metal-containing films and chamber clean
US-2025226227-A1 · Jul 10, 2025 · US
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
US-12331402-B2 · Jun 17, 2025 · US
Transformer coupled plasma source design for thin dielectric film deposition
US-2025132127-A1 · Apr 24, 2025 · US
Apparatuses and techniques for cleaning a multi-station semiconductor processing chamber
US-2025022696-A1 · Jan 16, 2025 · US
Integrated showerhead with improved hole pattern for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
US-2025003074-A1 · Jan 2, 2025 · US
Recent patents
Latest publications not already listed above.
Apparatuses for cleaning a multi-station semiconductor processing chamber
US-2025006514-A1 · Jan 2, 2025 · US
Apparatuses and systems for ammonia/chlorine chemistry semiconductor processing
US-2024412953-A1 · Dec 12, 2024 · US
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
US-2024318312-A1 · Sep 26, 2024 · US
Minimizing radical recombination using ald silicon oxide surface coating with intermittent restoration plasma
US-2024218509-A1 · Jul 4, 2024 · US
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
US-12000047-B2 · Jun 4, 2024 · US
Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma
US-11920239-B2 · Mar 5, 2024 · US
Showerhead with integral divert flow path
US-2023374661-A1 · Nov 23, 2023 · US
Remote plasma architecture for true radical processing
US-2023332291-A1 · Oct 19, 2023 · US
Wafer level uniformity control in remote plasma film deposition
US-2023304156-A1 · Sep 28, 2023 · US
Increasing plasma uniformity in a receptacle
US-2023223238-A1 · Jul 13, 2023 · US
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
US-2023175134-A1 · Jun 8, 2023 · US
Pedestal setup using camera wafer
US-2022282380-A1 · Sep 8, 2022 · US
Independently adjustable flowpath conductance in multi-station semiconductor processing
US-2022228263-A1 · Jul 21, 2022 · US
Minimizing radical recombination using ald silicon oxide surface coating with intermittent restoration plasma
US-2022145459-A1 · May 12, 2022 · US
High density hole pattern dual plenum hole showerhead assembly
US-D948658-S · Apr 12, 2022 · US
Minimizing radical recombination using ald silicon oxide surface coating with intermittent restoration plasma
US-2018044791-A1 · Feb 15, 2018 · US
Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma
US-9828672-B2 · Nov 28, 2017 · US
Minimizing radical recombination using ald silicon oxide surface coating with intermittent restoration plasma
US-2016281230-A1 · Sep 29, 2016 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Lam Res Corp | 28 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C23C16/45565 | 17 |
| H01J37/32357 | 14 |
| C23C16/505 | 12 |
| C23C16/4581 | 11 |
| H10P72/0402 | 10 |