Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching
US-12049699-B2 · Jul 30, 2024 · US
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Abel Joseph patents
Abel Joseph is listed as an inventor on 15 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Abel Joseph |
| Total patents | 15 |
| First publication | Mar 14, 2019 |
| Latest publication | Jul 30, 2024 |
Notable patents
Publications ranked by popularity score, then publication date.
Gas feed system for surface modified depth controlled deposition for plasma based deposition
US-2022301866-A1 · Sep 22, 2022 · US
Dielectric gapfill using atomic layer deposition (ald), inhibitor plasma and etching
US-2022205096-A1 · Jun 30, 2022 · US
Surface modified depth controlled deposition for plasma based deposition
US-11373862-B2 · Jun 28, 2022 · US
Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching
US-11293098-B2 · Apr 5, 2022 · US
Method of improving deposition induced CD imbalance using spatially selective ashing of carbon based film
US-10978302-B2 · Apr 13, 2021 · US
Surface modified depth controlled deposition for plasma based deposition
US-2020357636-A1 · Nov 12, 2020 · US
Surface modified depth controlled deposition for plasma based deposition
US-10727046-B2 · Jul 28, 2020 · US
Method monitoring chamber drift
US-10636686-B2 · Apr 28, 2020 · US
Dielectric gapfill using atomic layer deposition (ald), inhibitor plasma and etching
US-2020017967-A1 · Jan 16, 2020 · US
Recent patents
Latest publications not already listed above.
Surface modified depth controlled deposition for plasma based deposition
US-2020013616-A1 · Jan 9, 2020 · US
Method monitoring chamber drift
US-2019267268-A1 · Aug 29, 2019 · US
Method of improving deposition induced cd imbalance using spatially selective ashing of carbon based film
US-2019164757-A1 · May 30, 2019 · US
Dielectric gapfill of high aspect ratio features utilizing a sacrificial etch cap layer
US-10269559-B2 · Apr 23, 2019 · US
Dielectric gapfill of high aspect ratio features utilizing a sacrificial etch cap layer
US-2019080903-A1 · Mar 14, 2019 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Lam Res Corp | 15 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P14/6336 | 15 |
| H10P14/6339 | 13 |
| H10P14/69215 | 10 |
| C23C16/52 | 9 |
| C23C16/45525 | 9 |