Precursors and methods for atomic layer deposition of transition metal oxides
US-11555242-B2 · Jan 17, 2023 · US
This patent family groups 6 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 45022355 |
| Family type | — |
| Earliest priority | Feb 25, 2010 |
| First filing country | US |
| Member publications | 6 |
| Countries | US |
| Representative publication | US11555242B2 — Precursors and methods for atomic layer deposition of transition metal oxides |
Best representative member for this family based on priority and filing country.
US11555242B2 — Precursors and methods for atomic layer deposition of transition metal oxides (published Jan 17, 2023)
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