Ion implanter, ion implantation method, and semiconductor device manufacturing method
US-12255039-B2 · Mar 18, 2025 · US
using particle {beam} bombardment, e.g. ionisers
using particle {beam} bombardment, e.g. ionisers · Cooperative Patent Classification (CPC)
Electric circuits, power, telecommunications, and semiconductors.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | H01J27/20 |
| Official title | using particle {beam} bombardment, e.g. ionisers |
| Display label | using particle {beam} bombardment, e.g. ionisers |
| Total patents | 27 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2016 | 2 |
| 2017 | 2 |
| 2018 | 4 |
| 2019 | 4 |
| 2020 | 4 |
| 2021 | 5 |
| 2022 | 3 |
| 2023 | 1 |
| 2024 | 1 |
| 2025 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Apparatus and method
US-2024014022-A1 · Jan 11, 2024 · US
Discharge chambers and ionization devices, methods and systems using them
US-11705319-B2 · Jul 18, 2023 · US
Ion implanter, ion implantation method, and semiconductor device manufacturing method
US-2022130636-A1 · Apr 28, 2022 · US
Discharge chambers and ionization devices, methods and systems using them
US-2022102130-A1 · Mar 31, 2022 · US
Ion source
US-11282691-B2 · Mar 22, 2022 · US
Paint hardening device and paint hardening method
US-11097310-B2 · Aug 24, 2021 · US
Ionization chamber chip for a nano-aperture ion source, method of fabrication thereof, and a proton beam writing system
US-11056315-B2 · Jul 6, 2021 · US
Discharge chambers and ionization devices, methods and systems using them
US-11031227-B2 · Jun 8, 2021 · US
Ion source
US-2021066059-A1 · Mar 4, 2021 · US
Ion implantation processes and apparatus using gallium
US-10892137-B2 · Jan 12, 2021 · US
Paint hardening device and paint hardening method
US-2020306792-A1 · Oct 1, 2020 · US
An ionization chamber chip for a nano-aperture ion source, method of fabrication thereof, and a proton beam writing system
US-2020211822-A1 · Jul 2, 2020 · US
Ion implantation processes and apparatus using gallium
US-2020083015-A1 · Mar 12, 2020 · US
Planar ion sources for spectrometers
US-2020027711-A1 · Jan 23, 2020 · US
Ion implantation processes and apparatus
US-10497532-B2 · Dec 3, 2019 · US
Discharge chambers and ionization devices, methods and systems using them
US-2019355565-A1 · Nov 21, 2019 · US
MEMS device for generating an ion beam
US-10395907-B2 · Aug 27, 2019 · US
Collision ionization source
US-10325750-B2 · Jun 18, 2019 · US
Mems device for generating an ion beam
US-2018254175-A1 · Sep 6, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC H01J27/20?
- CPC H01J27/20 is the Cooperative Patent Classification code for “using particle {beam} bombardment, e.g. ionisers.”
- How many patents are filed under CPC H01J27/20 (using particle {beam} bombardment, e.g. ionisers)?
- Our database includes 27 publications tagged with this CPC code.
- Is patent activity under CPC H01J27/20 growing?
- Publication counts under this code: 1 in 2024 vs 1 in 2025 (latest complete years).