Collision ionization source

Patent metadata

Field	Value
Publication number	US-10325750-B2
Application number	US-201815874798-A
Country	US
Kind code	B2
Filing date	Jan 18, 2018
Priority date	Jan 12, 2017
Publication date	Jun 18, 2019
Grant date	Jun 18, 2019

Abstract

A collision ionization source is disclosed herein. An example source includes an ionization region arranged to receive a gas and a charged particle beam, the charged particle beam to ionize at least some of the gas, and a supply duct arranged to provide the gas to the ionization region, the supply duct having a non-uniform height decreasing from an input orifice to an output orifice, the output orifice arranged adjacent to the ionization region.

First claim

What is claimed is:

1. An apparatus comprising:
an ionization region arranged to receive a gas and a charged particle beam, the charged particle beam to ionize at least some of the gas; and
a supply duct arranged to provide the gas to the ionization region, the supply duct having a non-uniform height decreasing from an input orifice to an output orifice, the output orifice arranged adjacent to the ionization region.

2. The apparatus of claim 1 , further comprising:
a first plate forming a top of the supply duct and having a first aperture; and
a second plate forming a bottom of the supply duct and having a second aperture,
wherein the first and second apertures are aligned.

3. The apparatus of claim 2 , wherein the ionization region is defined by a region between the first and second plates and coincident with the first and second apertures, and wherein the charged particle beam enters the ionization region through the first aperture.

4. The apparatus of claim 2 , wherein the charged particle beam enters the ionization region through the first aperture.

5. The apparatus of claim 2 , wherein ionized gas exits the ionization region through the second aperture.

6. The apparatus of claim 1 , wherein the supply duct is defined by a first height region, a second height region, and a transition region arranged between the first and second height regions.

7. The apparatus of claim 6 , wherein the first height region is adjacent to the input orifice and the second height region is adjacent to the output orifice.

8. The apparatus of claim 6 , wherein the first height region is larger than the second height region.

9. The apparatus of claim 6 , wherein the transition region has a shape selected from one of a taper, a single step, and a multiple step.

10. An apparatus comprising:
a first plate including a first aperture; and
a second plate including a second aperture,
wherein the first and second plates are arranged with their respective apertures aligned, and to form a supply duct of non-uniform height between the first and second plates, and
wherein the supply duct includes a first height region, a transition region and a second height region, the second height region arranged coincident with the first and second apertures, and the first height region separated from the second height region by the transition region, and
wherein the first height region has a height that is greater than the second height region.

11. The apparatus of claim 10 , wherein an ionization region is formed between the first and second apertures, the ionization region arranged to receive a charged particle beam through the first aperture to ionize at least some of a gas provided through the supply duct.

12. The apparatus of claim 11 , wherein the supply duct incudes an input orifice defined by the first height region and an output orifice defined by the second height region, the supply duct to receive the gas through the input orifice and supply the ionization region the gas through the output orifice.

13. The apparatus of claim 11 , wherein the ionized gas exits through the second aperture.

14. The apparatus of claim 10 , wherein the transition region includes a step between the first and second height regions.

15. The apparatus of claim 10 , wherein the transition region includes multiple steps between the first and second height regions.

16. The apparatus of claim 10 , wherein the transition region forms a taper between the first and second height regions.

17. The apparatus of claim 10 , wherein the first plate includes a sloped portion that slopes down from the first height region to the second height region, the sloped portion defining the transition region.

18. The apparatus of claim 10 , the first plate includes a step change in thickness toward the second plate, the step change in thickness defining the transition region.

19. The apparatus of claim 10 , further including a gas flow plug disposed between the first and second plates and disposed on a side of the first and second apertures opposite the supply duct.

20. The apparatus of claim 10 , wherein an electric field is formed between the first and second plates.

Assignees

• Fei Co

Inventors

• Schwind Gregory A
• Botman Aurelien Philippe Jean Maclou
• Kellogg Sean
• Kouwen Leon Van
• Mele Luigi

Classifications

• H01J2237/006

  Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece, (H01J37/3244 takes precedence; environmental cells for electron microscopes H01J2237/2003; microscopes with environmental specimen chamber H01J2237/2608) · CPC title

• H01J27/205

  with electrons, e.g. electron impact ionisation, electron attachment · CPC title

• H01J37/26

  Electron or ion microscopes; Electron or ion diffraction tubes · CPC title

• H01J37/08 Primary

  Ion sources; Ion guns · CPC title

• H01J2237/061

  Construction · CPC title