Vaporizer for ion source

Patent metadata

Field	Value
Publication number	US-9928983-B2
Application number	US-201615198742-A
Country	US
Kind code	B2
Filing date	Jun 30, 2016
Priority date	Jun 30, 2016
Publication date	Mar 27, 2018
Grant date	Mar 27, 2018

Abstract

A vaporizer with several novel features to prevent vapor condensation and the clogging of the nozzle is disclosed. The vaporizer is designed such that there is an increase in temperature along the path that the vapor travels as it flows from the crucible to the arc chamber. The vaporizer uses a nested architecture, where the crucible is installed within an outer housing. Vapor leaving the crucible exits through an aperture and travels along the volume between the crucible and the outer housing to the nozzle, where it flows to the arc chamber. In certain embodiments, the aperture in the crucible is disposed at a location where liquid in the crucible cannot reach the aperture.

First claim

What is claimed is:

1. A vaporizer, comprising:
a crucible in which a dopant material may be disposed, having an aperture passing through a sidewall of the crucible;
an outer housing surrounding the crucible;
a vapor channel disposed between the outer housing and the crucible, wherein the aperture is in communication with the vapor channel; and
a gas nozzle attached to one end of the outer housing in communication with the vapor channel.

2. The vaporizer of claim 1 , wherein the crucible and the outer housing are concentric cylinders.

3. The vaporizer of claim 1 , comprising a heat source disposed outside of the outer housing.

4. The vaporizer of claim 1 , comprising a heat source embedded in the outer housing.

5. The vaporizer of claim 1 , wherein a temperature in the vapor channel is greater than a temperature in the crucible.

6. The vaporizer of claim 1 , wherein the aperture is disposed in a location so that liquid in the crucible cannot reach the aperture.

7. The vaporizer of claim 1 , wherein vapor travels in a path from the crucible through the aperture into the vapor channel and to the gas nozzle, and wherein a temperature is increasing as the vapor flows along the path from the aperture to the gas nozzle.

8. The vaporizer of claim 1 , comprising a spacer disposed between the crucible and the outer housing, separating the crucible and the outer housing.

9. The vaporizer of claim 8 , wherein the spacer is constructed of a thermally insulating material.

10. The vaporizer of the claim 8 , wherein the spacer is disposed between the gas nozzle and the aperture, and the spacer comprises an opening to allow vapor to pass.

11. The vaporizer of claim 1 ,
wherein the crucible is thermally isolated from the outer housing.

12. A vaporizer, comprising:
a crucible in which a dopant material may be disposed, the crucible being cylindrical, sealed on two ends and having an aperture passing through a sidewall of the crucible;
an outer housing surrounding the crucible, wherein a body of the outer housing is cylindrical; and
a vapor channel disposed between the crucible and the outer housing, wherein the aperture is in communication with the vapor channel;
wherein the outer housing comprises a first end and a second end opposite the first end, with a gas nozzle attached to the first end of the outer housing and in communication with the vapor channel.

13. The vaporizer of claim 12 , wherein the vaporizer is oriented in an ion source such that the first end is lower than the second end, and wherein the aperture is disposed near the second end.

14. The vaporizer of claim 12 , wherein the vaporizer is oriented in an ion source such that the first end is higher than the second end, and wherein the aperture is disposed near the first end.

15. The vaporizer of claim 12 , comprising a spacer disposed between the crucible and the outer housing, separating the crucible and the outer housing.

16. The vaporizer of claim 15 , wherein the spacer is constructed of a thermally insulating material.

17. The vaporizer of the claim 15 , wherein the spacer is disposed between the gas nozzle and the aperture, and the spacer comprises an opening to allow vapor to pass.

Assignees

• Varian Semiconductor Equipment Ass Inc

Inventors

• Chaney Craig R
• Sporleder David P

Classifications

• H01J27/022 Primary

  Details · CPC title

• H01J27/02 Primary

  Ion sources; Ion guns {(for examination or processing discharge tubes H01J37/08; ion sources, ion guns for particle spectrometer or separator tubes H01J49/10; ion propulsion F03H1/00)} · CPC title

• H01J37/08

  Ion sources; Ion guns · CPC title

• H01J27/16

  using high-frequency excitation, e.g. microwave excitation · CPC title