Greyscale lithography for substrate topography correction
US-2026093184-A1 · Apr 2, 2026 · US
Exposing with the same light pattern different positions of the same surface at the same time {(G03F7/70 takes precedence)}
Exposing with the same light pattern different positions of the same surface at the same time {(G03F7/70 takes precedence)} · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/213 |
| Official title | Exposing with the same light pattern different positions of the same surface at the same time {(G03F7/70 takes precedence)} |
| Display label | Exposing with the same light pattern different positions of the same surface at the same time {(G03F7/70 takes precedence)} |
| Total patents | 25 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2016 | 3 |
| 2017 | 2 |
| 2018 | 3 |
| 2019 | 2 |
| 2020 | 5 |
| 2021 | 3 |
| 2022 | 2 |
| 2023 | 2 |
| 2024 | 1 |
| 2025 | 1 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Lithography processes for dual damascene structures
US-2025390026-A1 · Dec 25, 2025 · US
Method for adjusting local thickness of photoresist
US-2024019783-A1 · Jan 18, 2024 · US
Exposure apparatus
US-2023120789-A1 · Apr 20, 2023 · US
Multiple camera apparatus for photolithographic processing
US-2023043353-A1 · Feb 9, 2023 · US
Optical patterning systems and methods
US-11448965-B2 · Sep 20, 2022 · US
Dual developing method for defining different resist patterns
US-2022260916-A1 · Aug 18, 2022 · US
Optical patterning systems and methods
US-2021311397-A1 · Oct 7, 2021 · US
Large area high resolution feature reduction lithography technique
US-11042098-B2 · Jun 22, 2021 · US
Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method
US-11022900-B2 · Jun 1, 2021 · US
Method and device for exposure of photosensitive layer
US-10852528-B2 · Dec 1, 2020 · US
Inspection Apparatus and Methods, Substrates Having Metrology Targets, Lithographic System and Device Manufacturing Method
US-2020348605-A1 · Nov 5, 2020 · US
Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method
US-10761432-B2 · Sep 1, 2020 · US
Large area high resolution feature reduction lithography technique
US-2020264518-A1 · Aug 20, 2020 · US
Mask for deposition and method of manufacturing the same
US-10665785-B2 · May 26, 2020 · US
Method and device for exposure of photosensitive layer
US-2019293924-A1 · Sep 26, 2019 · US
Mask for deposition and method of manufacturing the same
US-2019027686-A1 · Jan 24, 2019 · US
Inspection Apparatus and Methods, Substrates Having Metrology Targets, Lithographic System and Device Manufacturing Method
US-2018239263-A1 · Aug 23, 2018 · US
Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method
US-9958791-B2 · May 1, 2018 · US
Exposure method, substrate and exposure apparatus
US-2018052395-A1 · Feb 22, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/213?
- CPC G03F7/213 is the Cooperative Patent Classification code for “Exposing with the same light pattern different positions of the same surface at the same time {(G03F7/70 takes precedence)}.”
- How many patents are filed under CPC G03F7/213 (Exposing with the same light pattern different positions of the same surface at the same time {(G03F7/70 takes precedence)})?
- Our database includes 25 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/213 growing?
- Publication counts under this code: 1 in 2024 vs 1 in 2025 (latest complete years).